SCHEMBL27628848

SCHEMBL27628848

CCO[SiH3].c1ccc(-c2ccccc2C23CC4CC(CC(C4)C2)C3)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.40
SLC6A2 P23975 1/20 0.39
SLC6A4 P31645 1/20 0.39
SLC6A3 Q01959 1/20 0.39
HSD11B1 P28845 1/20 0.39
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
NPSR1 Q6W5P4 1/20 0.38
SIGMAR1 Q99720 1/20 0.36
ALDH1A1 P00352 1/20 0.35
POLB P06746 1/20 0.35
MAPT P10636 1/20 0.35
CTSD P07339 2/20 0.34
BACE1 P56817 2/20 0.34
BACE2 Q9Y5Z0 1/20 0.34
CNR2 P34972 2/20 0.33
RARB P10826 2/20 0.33
RARG P13631 2/20 0.33
ADRB2 P07550 1/20 0.33
LMNA P02545 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27694967 0.86 MEN1 (0.46) HTTSLC6A2SLC6A4SLC6A3HSD11B1
SCHEMBL21038138 0.81 MEN1 (0.39) HTTSLC6A2SLC6A4SLC6A3HSD11B1
SCHEMBL18582441 0.78 HSD11B1 (0.40) HTTSLC6A2SLC6A4SLC6A3HSD11B1
SCHEMBL27676406 0.75 MEN1 (0.43) HTTSLC6A2SLC6A4SLC6A3HSD11B1
Phosphine SCHEMBL2005915 0.74 MEN1 (0.42) HTTSLC6A2SLC6A4SLC6A3HSD11B1
SCHEMBL27676404 0.74 MEN1 (0.40) HTTSLC6A2SLC6A4SLC6A3HSD11B1
SCHEMBL21038361 0.73 CA12 (0.36) HTTSLC6A2SLC6A4SLC6A3MEN1
SCHEMBL21038179 0.70 HTT (0.36) HTTHSD11B1MEN1KMT2ANPSR1
SCHEMBL21038140 0.70 HTT (0.36) HTTHSD11B1MEN1KMT2ANPSR1
SCHEMBL27829406 0.69 SLC6A2 (0.41) HTTSLC6A2SLC6A4SLC6A3HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100415752-C Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORP (JP) 2008-09-03 CN disclosed
CN-100335488-C Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORP (JP) 2007-09-05 CN disclosed
CN-1803805-A Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORP (JP) 2006-07-19 CN disclosed
CN-1793151-A Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORP (JP) 2006-06-28 CN disclosed