Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL27633666

N.c1ccc(OOc2ccccc2)cc1

nearest known ligand 0.56

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 4/20 0.56
TSHR P16473 1/20 0.56
CA4 P22748 1/20 0.50
TAAR1 Q96RJ0 1/20 0.46
KCNA3 P22001 1/20 0.45
CA5A P35218 1/20 0.43
CA5B Q9Y2D0 1/20 0.43
NR1H2 P55055 1/20 0.41
BAX Q07812 1/20 0.41
MAOA P21397 1/20 0.41
CYP2A6 P11509 1/20 0.40
ALOX12 P18054 1/20 0.40
ORAI1 Q96D31 1/20 0.40
ORAI2 Q96SN7 1/20 0.40
ORAI3 Q9BRQ5 1/20 0.40
TRPV6 Q9H1D0 1/20 0.40
ALDH1A1 P00352 1/20 0.39
RECQL P46063 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL28238950 0.96 LTA4H (0.53) LTA4HTSHRCA4TAAR1KCNA3
SCHEMBL14905 0.96 LTA4H (0.60) LTA4HTSHRCA4TAAR1KCNA3
SCHEMBL27847049 0.92 LTA4H (0.56) LTA4HTSHRCA4TAAR1KCNA3
Methane SCHEMBL28804943 0.92 LTA4H (0.56) LTA4HTSHRCA4TAAR1KCNA3
SCHEMBL17049455 0.92 LTA4H (0.56) LTA4HTSHRCA4TAAR1KCNA3
SCHEMBL27304222 0.92 LTA4H (0.56) LTA4HTSHRCA4TAAR1KCNA3
SCHEMBL9586944 0.92 LTA4H (0.56) LTA4HTSHRCA4TAAR1KCNA3
Biphenyl SCHEMBL10754513 0.86 ALDH1A1 (0.60) LTA4HTSHRCA4TAAR1KCNA3
Methylamine SCHEMBL27961578 0.86 CA4 (0.53) LTA4HTSHRCA4TAAR1KCNA3
Methyl Alcohol SCHEMBL28285968 0.86 CA4 (0.53) LTA4HTSHRCA4TAAR1KCNA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1721494-A Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method JSR CORP (JP) 2006-01-18 CN disclosed