SCHEMBL27634858

SCHEMBL27634858

C=C(C)C(=O)OC1CC=Cc2c1ccc1c2ccc2ccccc21

nearest known ligand 0.35

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.35
ALDH1A1 P00352 1/20 0.35
HPGD P15428 1/20 0.35
MTNR1A P48039 2/20 0.33
MTNR1B P49286 2/20 0.33
HPRT1 P00492 1/20 0.33
MEN1 O00255 3/20 0.32
KMT2A Q03164 3/20 0.32
ATM Q13315 2/20 0.32
RAB9A P51151 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
CA12 O43570 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA9 Q16790 1/20 0.31
KDM4E B2RXH2 1/20 0.30
MAPK1 P28482 1/20 0.30
RCE1 Q9Y256 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27662711 0.84 HPRT1 (0.33) MAPTALDH1A1HPGDHPRT1MEN1
SCHEMBL27278686 0.81 ALDH1A1 (0.35) MAPTALDH1A1HPGDMTNR1AMTNR1B
SCHEMBL27657807 0.81 MTNR1A (0.35) MAPTALDH1A1HPGDMTNR1AMTNR1B
SCHEMBL29733205 0.73 ALDH1A1 (0.50) MAPTALDH1A1HPGDHPRT1MEN1
SCHEMBL13374668 0.73 ALDH1A1 (0.50) MAPTALDH1A1HPGDHPRT1MEN1
SCHEMBL29617400 0.73 ALDH1A1 (0.50) MAPTALDH1A1HPGDHPRT1MEN1
SCHEMBL27100742 0.73 ALDH1A1 (0.50) MAPTALDH1A1HPGDHPRT1MEN1
SCHEMBL10876827 0.73 HPRT1 (0.44) MAPTALDH1A1HPGDHPRT1MEN1
SCHEMBL28862240 0.70 HPRT1 (0.44) MAPTALDH1A1HPGDMTNR1AHPRT1
SCHEMBL28049169 0.70 HPRT1 (0.44) MAPTALDH1A1HPGDMTNR1AHPRT1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101687781-B Compound for photoacid generator and use its anti-corrosion agent composition, pattern formation method CENTRAL GLASS CO.,LTD. (JP) 2015-08-12 CN disclosed
CN-102449000-B Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method CENTRAL GLASS CO LTD 2015-04-22 CN disclosed
CN-102186890-B Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same CENTRAL GLASS CO LTD 2013-07-31 CN disclosed
CN-102449000-A Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method CENTRAL GLASS CO LTD 2012-05-09 CN disclosed
CN-102186890-A Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same CENTRAL GLASS CO LTD 2011-09-14 CN disclosed
CN-1819987-B Polymerizable acrylate compound containing hexafluorocarbinol group and polymer produced therefrom CENTRAL GLASS CO LTD 2010-08-25 CN disclosed
CN-101687781-A Compound for photoacid generator, resist composition using the same, and pattern-forming method CENTRAL GLASS CO LTD 2010-03-31 CN disclosed
CN-1819987-A Polymerizable acrylate compound containing hexafluorocarbinol group and polymer produced therefrom CENTRAL GLASS CO LTD (JP) 2006-08-16 CN disclosed