SCHEMBL27652136

SCHEMBL27652136

C[C](C)C(O)(c1ccccc1)C(C)C

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 3/20 0.44
CYP1A2 P05177 2/20 0.44
CYP2C19 P33261 4/20 0.41
ALDH1A1 P00352 3/20 0.41
HSD17B10 Q99714 1/20 0.41
KIF11 P52732 1/20 0.39
CRHBP P24387 1/20 0.38
CRHR2 Q13324 1/20 0.38
HIF1A Q16665 1/20 0.38
ALOX15 P16050 1/20 0.37
MEN1 O00255 1/20 0.36
TTR P02766 1/20 0.36
KMT2A Q03164 1/20 0.36
CYP3A4 P08684 3/20 0.35
ESR1 P03372 2/20 0.35
ESR2 Q92731 2/20 0.35
CYP2C9 P11712 1/20 0.35
MAPK1 P28482 2/20 0.35
GAA P10253 1/20 0.35
KDM4E B2RXH2 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11545801 0.87 CYP2D6 (0.50) CYP2D6CYP1A2CYP2C19ALDH1A1HSD17B10
SCHEMBL6950057 0.80 CYP2D6 (0.57) CYP2D6CYP1A2CYP2C19ALDH1A1HSD17B10
SCHEMBL27632932 0.77 MAPT (0.53) CYP2D6CYP1A2CYP2C19ALDH1A1HSD17B10
SCHEMBL3521078 0.75 CES1 (0.50) CYP2D6CYP1A2CYP2C19ALDH1A1KIF11
SCHEMBL10717791 0.74 KCNN4 (0.58) CYP2D6CYP1A2CYP2C19HIF1AMEN1
SCHEMBL29608887 0.73 CYP2D6 (0.48) CYP2D6CYP1A2CYP2C19ALDH1A1HSD17B10
SCHEMBL6470482 0.73 CYP2C19 (0.55) CYP2D6CYP1A2CYP2C19ALDH1A1HSD17B10
SCHEMBL9723670 0.73 CYP2D6 (0.48) CYP2D6CYP1A2CYP2C19ALDH1A1HSD17B10
SCHEMBL3959121 0.71 CYP2D6 (0.47) CYP2D6CYP1A2CYP2C19ALDH1A1HSD17B10
SCHEMBL12884227 0.71 CYP2D6 (0.47) CYP2D6CYP1A2CYP2C19ALDH1A1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108008600-A Radiation-ray sensitive composition 三菱瓦斯化学株式会社 2018-05-08 CN disclosed
CN-107924123-A Photoetching material and its manufacture method, photoetching composition, pattern formation method and, compound, resin and their purification process 学校法人关西大学 2018-04-17 CN disclosed
CN-107428717-A Resist composition, resist pattern forming method, and polyphenol compound used for same 三菱瓦斯化学株式会社 2017-12-01 CN disclosed
CN-103946204-B Cyclic compound, its manufacture method, radiation-sensitive composition and corrosion-resisting pattern forming method 三菱瓦斯化学株式会社 2016-08-24 CN disclosed
CN-103717562-B Cyclic compound, its manufacture method, compositions and corrosion-resisting pattern forming method 三菱瓦斯化学株式会社 2016-08-24 CN disclosed
CN-105264440-A Resist composition MITSUBISHI GAS CHEMICAL CO 2016-01-20 CN disclosed
CN-104737073-A Resist composition MITSUBISHI GAS CHEMICAL CO 2015-06-24 CN disclosed
CN-104281006-A Radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO 2015-01-14 CN disclosed
CN-103733135-A Resist composition, method for forming resist pattern, polyphenol compound used for the same, and alcohol compound derived from the polyphenol compound MITSUBISHI GAS CHEMICAL CO 2014-04-16 CN disclosed
CN-1942825-B Resist composition MITSUBISHI GAS CHEMICAL CO 2010-05-12 CN disclosed
CN-1942825-A Resist composition MITSUBISHI GAS CHEMICAL CO (JP) 2007-04-04 CN disclosed