SCHEMBL27657368

SCHEMBL27657368

COC(C[SiH3])C(OC)(OC)OC(=O)/C=C\C(=O)O

nearest known ligand 0.40

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 8/20 0.40
KDM4E B2RXH2 1/20 0.31
ALDH1A1 P00352 1/20 0.31
MAPT P10636 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28080243 1.00 HCAR2 (0.40) HCAR2KDM4EALDH1A1MAPTTDP1
Hydrogen Sulfide SCHEMBL27690717 0.70 ALDH1A1 (0.35) ALDH1A1
SCHEMBL28017830 0.67
SCHEMBL1880532 0.66 HCAR2 (0.54) HCAR2KDM4EALDH1A1MAPTTDP1
SCHEMBL10595074 0.66 HCAR2 (0.54) HCAR2KDM4EALDH1A1MAPTTDP1
SCHEMBL1884144 0.66 HCAR2 (0.54) HCAR2KDM4EALDH1A1MAPTTDP1
SCHEMBL1880536 0.66 HCAR2 (0.54) HCAR2KDM4EALDH1A1MAPTTDP1
SCHEMBL10595078 0.66 HCAR2 (0.54) HCAR2KDM4EALDH1A1MAPTTDP1
SCHEMBL10596883 0.66 HCAR2 (0.54) HCAR2KDM4EALDH1A1MAPTTDP1
SCHEMBL4244809 0.66 TSHR (0.35) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107743493-A Method for preparing acryloxy silane 美国道康宁公司 2018-02-27 CN disclosed
CN-104447836-B Method for preparing acryloxy silane 道康宁公司 2018-02-27 CN disclosed
CN-107743492-A Method for preparing acryloxy silane 美国道康宁公司 2018-02-27 CN disclosed
CN-103443143-B The method for producing silyl-functional polyolefin and combining the silyl-functional polyolefin of silyl group monomer 道康宁公司 2017-08-04 CN disclosed
CN-103154006-B Process for preparing acryloxysilanes 道康宁公司 2016-07-06 CN disclosed
CN-101506736-B Composition containing liquid additive for forming resist underlayer film, underlayer film forming method and semiconductor device manufacture method NISSAN CHEMICAL IND LTD 2013-07-10 CN disclosed
CN-101506736-A Resist underlayer film forming composition containing liquid additive NISSAN CHEMICAL IND LTD (JP) 2009-08-12 CN disclosed
CN-1830202-A Composition for forming lower layer film for lithography comprising compound having protected carboxyl group NISSAN CHEMICAL IND LTD (JP) 2006-09-06 CN disclosed