SCHEMBL1884144

SCHEMBL1884144

COC(C)(OC)OC(=O)/C=C/C(=O)O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 11/20 0.54
TSHR P16473 3/20 0.39
TP53 P04637 1/20 0.39
EGLN1 Q9GZT9 1/20 0.39
EGLN3 Q9H6Z9 1/20 0.39
ALDH1A1 P00352 3/20 0.39
KDM4E B2RXH2 1/20 0.39
MAPT P10636 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
KEAP1 Q14145 1/20 0.39
NFE2L2 Q16236 1/20 0.39
ALOX15 P16050 1/20 0.36
RECQL P46063 1/20 0.36
HSD17B10 Q99714 1/20 0.36
GABRP O00591 2/20 0.32
GABRD O14764 2/20 0.32
GABRA1 P14867 2/20 0.32
GABRB1 P18505 2/20 0.32
GABRG2 P18507 2/20 0.32
GABRB3 P28472 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1880536 1.00 HCAR2 (0.54) HCAR2TSHRTP53EGLN1EGLN3
SCHEMBL1880532 1.00 HCAR2 (0.54) HCAR2TSHRTP53EGLN1EGLN3
SCHEMBL1880530 0.91 HCAR2 (0.46) HCAR2KEAP1NFE2L2
SCHEMBL1884143 0.91 HCAR2 (0.46) HCAR2KEAP1NFE2L2
SCHEMBL10595074 0.83 HCAR2 (0.54) HCAR2TSHRTP53EGLN1EGLN3
SCHEMBL10595078 0.83 HCAR2 (0.54) HCAR2TSHRTP53EGLN1EGLN3
SCHEMBL10596883 0.83 HCAR2 (0.54) HCAR2TSHRTP53EGLN1EGLN3
SCHEMBL642105 0.79 HCAR2 (0.54) HCAR2TSHRTP53EGLN1EGLN3
SCHEMBL642104 0.79 HCAR2 (0.54) HCAR2TSHRTP53EGLN1EGLN3
SCHEMBL1964699 0.79 HCAR2 (0.54) HCAR2TSHRTP53EGLN1EGLN3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113165257-A Apparatus for producing cured resin film and method for producing cured resin film 昭和电工株式会社 2021-07-23 CN disclosed
US-7939612-B2 Radically polymerizable compound having a cyclic dithiocarbonate group SHOWA DENKO K.K. (JP) 2011-05-10 US disclosed
EP-1979383-B1 RADICALLY POLYMERIZABLE COMPOUND HAVING A CYCLIC DITHIOCARBONATE GROUP SHOWA DENKO KK (JP) 2010-09-22 EP disclosed
US-20100199491-A1 MANUFACTURING METHOD OF IMAGE PICK-UP DEVICE, IMAGE PICK-UP DEVICE AND OPTICAL ELEMENT KONICA MINOLTA OPTO, INC. (JP) 2010-08-12 US disclosed
EP-2166395-A1 IMAGING DEVICE MANUFACTURING METHOD, IMAGING DEVICE AND OPTICAL ELEMENT Konica Minolta Opto, Inc. (JP) 2010-03-24 EP disclosed
US-20090270574-A1 RADICALLY POLYMERIZABLE COMPOUND HAVING A CYCLIC DITHIOCARBONATE GROUP SHOWA DENKO K.K. (JP) 2009-10-29 US disclosed
EP-2094654-A1 RADICALLY POLYMERIZABLE COMPOUND HAVING A DITHIOCARBONATE STRUCTURE AND A SULFUR-CONTAINING ALLYLCARBONATE Showa Denko K.K. (JP) 2009-09-02 EP disclosed
EP-1791824-B1 RADICALLY POLYMERIZABLE SULFUR-CONTAINING COMPOUND AND RADICALLY POLYMERIZABLE SULFUR-CONTAINING POLYMER SHOWA DENKO KK (JP) 2009-08-05 EP disclosed
US-20090192279-A1 Radically Polymerizable Sulfur-Containing Compound and Radically Polymerizable Sulfur-Containing Polymer SHOWA DENKO K.K. (JP) 2009-07-30 US disclosed
US-7518001-B2 Radically polymerizable sulfur-containing compound and radically polymerizable sulfur-containing polymer SHOWA DENKO K.K. (JP) 2009-04-14 US disclosed
US-20070208149-A1 Radically Polymerizable Sulfur-Containing Compound And Radically Polymerizable Sulfur-Containing Polymer SHOWA DENKO K.K. (JP) 2007-09-06 US disclosed
WO-2007086607-A2 RADICALLY POLYMERIZABLE COMPOUND HAVING A CYCLIC DITHIOCARBONATE GROUP SHOWA DENKO K.K. (JP) 2007-08-02 WO disclosed
EP-1791824-A1 RADICALLY POLYMERIZABLE SULFUR-CONTAINING COMPOUND AND RADICALLY POLYMERIZABLE SULFUR-CONTAINING POLYMER Showa Denko K.K. (JP) 2007-06-06 EP disclosed
WO-2006033438-A1 RADICALLY POLYMERIZABLE SULFUR-CONTAINING COMPOUND AND RADICALLY POLYMERIZABLE SULFUR-CONTAINING POLYMER SHOWA DENKO K.K. (JP) 2006-03-30 WO disclosed
US-6740721-B2 HAVING LOW VISCOSITY AND CAPABLE OF YIELDING A CURED MATERIAL HAVING A HIGH REFRACTIVE INDEX AND SMALL SPECIFIC GRAVITY SHOWA DENKO K.K. (JP) 2004-05-25 US disclosed
CN-1466598-A Plastic lens composition, plastic lens and method for producing the plastic lens �Ѻ͵繤��ʽ���� 2004-01-07 CN disclosed
US-20030149141-A1 Plastic lens composition, plastic lens,and process for producing the plastic lens SHOWA DENKO K.K. (JP) 2003-08-07 US disclosed
EP-1331494-A1 COMPOSITION FOR OPTICAL MATERIAL, OPTICAL MATERIAL, AND PLASTIC LENS NOF CORPORATION (JP) 2003-07-30 EP disclosed
EP-1328560-A2 PLASTIC LENS COMPOSITION, PLASTIC LENS, AND PROCESS FOR PRODUCING THE PLASTIC LENS Showa Denko K.K. (JP) 2003-07-23 EP disclosed
WO-2002026843-A2 PLASTIC LENS COMPOSITION, PLASTIC LENS, AND PROCESS FOR PRODUCING THE PLASTIC LENS SHOWA DENKO K. K. (JP) 2002-04-04 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090270574-A1 RADICALLY POLYMERIZABLE COMPOUND HAVING A CYCLIC DITHIOCARBONATE GROUP RIF1, CCNT1, CCNA1 HCAR2 4630/4885TSHR 2700/4885TP53 4606/4885
US-20070208149-A1 Radically Polymerizable Sulfur-Containing Compound And Radically Polymerizable Sulfur-Containing Polymer CBS, TST, MSRB3 HCAR2 2982/4885TSHR 4037/4885TP53 4630/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.