Known targets — ChEMBL curated mechanism
ABL1BMXBRAFBTKCHRNA4CHRNB2CSNK1EEGFRERBB2F10FLT1FLT3FLT4IGF1RINSRITKJAK3KDRKITOPRM1PARP1PARP2PDGFRBPIK3CDRAF1RETSLC18A2TECTXKdacAdacBdacCftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Diphenylacetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 2/20 | 0.58 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.58 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | PKM | P14618 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.45 |
| ▸ | MEN1 | O00255 | 2/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.45 |
| ▸ | LMNA | P02545 | 2/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | HTT | P42858 | 1/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.45 |
| ▸ | GAA | P10253 | 1/20 | 0.45 |
| ▸ | SRC | P12931 | 1/20 | 0.44 |
| ▸ | RECQL | P46063 | 1/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | CNR1 | P21554 | 1/20 | 0.43 |
| ▸ | CNR2 | P34972 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Diphenylacetic Acid SCHEMBL27667687 | 0.88 | TSHR (0.64) | CYP2D6MAPK1SMN1; SMN2TSHRALDH1A1 | |
| Mandelic Acid SCHEMBL16499233 | 0.87 | LMNA (0.60) | CYP2D6MAPK1SMN1; SMN2TSHRPKM | |
| Phenylglycine SCHEMBL3059831 | 0.84 | CYP2D6 (0.59) | CYP2D6MAPK1SMN1; SMN2TSHRPKM | |
| Phenylglycine SCHEMBL305330 | 0.84 | CYP2D6 (0.59) | CYP2D6MAPK1SMN1; SMN2TSHRPKM | |
| SCHEMBL1551142 | 0.84 | CNR1 (0.56) | CYP2D6MAPK1SMN1; SMN2MEN1KMT2A | |
| Isopropylbenzene SCHEMBL4211335 | 0.83 | CYP2D6 (0.61) | CYP2D6MAPK1SMN1; SMN2TSHRPKM | |
| SCHEMBL932442 | 0.82 | SMN1; SMN2 (0.73) | CYP2D6MAPK1SMN1; SMN2TSHRALDH1A1 | |
| SCHEMBL13836876 | 0.82 | SMN1; SMN2 (0.73) | CYP2D6MAPK1SMN1; SMN2TSHRALDH1A1 | |
| Toluene SCHEMBL180606 | 0.82 | SMN1; SMN2 (0.65) | CYP2D6MAPK1SMN1; SMN2TSHRALDH1A1 | |
| Benzene SCHEMBL5085625 | 0.82 | SMN1; SMN2 (0.64) | CYP2D6MAPK1SMN1; SMN2TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101034260-B | Photosensitive resin composition | DONGJIN SEMICOHEM CO LTD | 2012-07-18 | — | — | CN | claimed |
| CN-101034260-A | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-09-12 | — | — | CN | claimed |
| CN-105575775-B | Layer structure and the method and semiconductor device for manufacturing its method, forming pattern | 三星SDI株式会社 | 2019-08-13 | — | — | CN | disclosed |
| CN-105575775-A | Method of producing layer structure, layer structure, a method of forming patterns and a semiconductor device | SAMSUNG SDI CO LTD | 2016-05-11 | — | — | CN | disclosed |
| CN-101034260-B | Photosensitive resin composition | DONGJIN SEMICOHEM CO LTD | 2012-07-18 | — | — | CN | disclosed |
| CN-1975466-B | Optical film, polarizing plate and image display device | FUJI PHOTO FILM CO LTD | 2011-01-12 | — | — | CN | disclosed |
| CN-100552475-C | Antireflection film, Polarizer and image display device | FUJI PHOTO FILM CO LTD (JP) | 2009-10-21 | — | — | CN | disclosed |
| CN-101034260-A | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-09-12 | — | — | CN | disclosed |
| CN-1975466-A | Optical film, polarizing plate and image display device | FUJI FILM CORP (JP) | 2007-06-06 | — | — | CN | disclosed |
| CN-1908700-A | Antireflection film, polarizing plate, and image display device | FUJI PHOTO FILM CO LTD (JP) | 2007-02-07 | — | — | CN | disclosed |