Hydrochloric Acid

Hydrochloric Acid

SCHEMBL2767756

NC(=O)c1ccc[n+](Cc2ccc(Cl)cc2)c1.[Cl-]

nearest known ligand 0.71

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.71
L3MBTL1 Q9Y468 1/20 0.71
ATM Q13315 1/20 0.67
BACE1 P56817 2/20 0.52
KMT2A Q03164 2/20 0.51
MEN1 O00255 1/20 0.51
HSP90AA1 P07900 6/20 0.49
MAPT P10636 2/20 0.47
NNMT P40261 1/20 0.45
GPR84 Q9NQS5 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride Ion SCHEMBL5149117 0.97 NPSR1 (0.71) NPSR1L3MBTL1ATMBACE1KMT2A
Bromide SCHEMBL5149123 0.97 NPSR1 (0.71) NPSR1L3MBTL1ATMBACE1KMT2A
SCHEMBL13934018 0.91 NPSR1 (0.84) NPSR1L3MBTL1ATMBACE1KMT2A
Hydrochloric Acid SCHEMBL2767821 0.89 NPSR1 (0.77) NPSR1L3MBTL1ATMBACE1KMT2A
Hydrochloric Acid SCHEMBL5146777 0.87 NPSR1 (0.56) NPSR1L3MBTL1ATMKMT2AMEN1
Hydrochloric Acid SCHEMBL1527128 0.86 L3MBTL1 (0.94) NPSR1L3MBTL1ATMBACE1KMT2A
Hydrochloric Acid SCHEMBL34474900 0.86 L3MBTL1 (0.94) NPSR1L3MBTL1ATMBACE1KMT2A
Bromide SCHEMBL5146810 0.86 NPSR1 (0.77) NPSR1L3MBTL1ATMKMT2AMEN1
Fluoride Ion SCHEMBL5148073 0.86 NPSR1 (0.77) NPSR1L3MBTL1ATMKMT2AMEN1
Hydrochloric Acid SCHEMBL2770300 0.85 NPSR1 (0.71) NPSR1L3MBTL1ATMBACE1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8647491-B2 Pyrophosphate-based bath for plating of tin alloy layers ATOTECH DEUTSCHLAND GMBH (DE) 2014-02-11 US claimed
US-20100300890-A1 PYROPHOSPHATE-BASED BATH FOR PLATING OF TIN ALLOY LAYERS ATOTECH DEUTSCHLAND GMBH (DE) 2010-12-02 US claimed
EP-2103717-B1 Pyrophosphate-based bath for depositing tin alloy layers ATOTECH DEUTSCHLAND GMBH (DE) 2010-04-21 EP claimed
EP-2103717-A1 Pyrophosphate-based bath for depositing tin alloy layers ATOTECH Deutschland GmbH (DE) 2009-09-23 EP claimed
WO-2009109271-A2 PYROPHOSPHATE-BASED BATH FOR PLATING ON TIN ALLOY LAYERS ATOTECH DEUTSCHLAND GMBH (DE) 2009-09-11 WO claimed
US-8647491-B2 Pyrophosphate-based bath for plating of tin alloy layers ATOTECH DEUTSCHLAND GMBH (DE) 2014-02-11 US disclosed
US-20100300890-A1 PYROPHOSPHATE-BASED BATH FOR PLATING OF TIN ALLOY LAYERS ATOTECH DEUTSCHLAND GMBH (DE) 2010-12-02 US disclosed
US-20100236936-A1 Aqueous,alkaline,cyanide-free bath for the galvanic deposition of zinc and zinc alloy coatings ATOTECH DEUTSCHLAND GMBH (DE) 2010-09-23 US disclosed
US-20100155257-A1 Aqueous, alkaline, cyanide-free bath for the galvanic deposition of zinc alloy coatings ATOTECH DEUTSCHLAND GMBH (DE) 2010-06-24 US disclosed
EP-2103717-B1 Pyrophosphate-based bath for depositing tin alloy layers ATOTECH DEUTSCHLAND GMBH (DE) 2010-04-21 EP disclosed
EP-2103717-A1 Pyrophosphate-based bath for depositing tin alloy layers ATOTECH Deutschland GmbH (DE) 2009-09-23 EP disclosed
WO-2009109271-A2 PYROPHOSPHATE-BASED BATH FOR PLATING ON TIN ALLOY LAYERS ATOTECH DEUTSCHLAND GMBH (DE) 2009-09-11 WO disclosed
EP-2038453-A2 AQUEOUS ALKALINE BATH, DEVOID OF CYANIDE, FOR THE DEPOSITION OF ELECTROPLATED ZINC AND ZINC ALLOY COATINGS ATOTECH DEUTSCHLAND GMBH (DE) 2009-03-25 EP disclosed
EP-2032742-A2 AQUEOUS, ALKALINE BATH, DEVOID OF CYANIDE, FOR DEPOSITING ELECTROPLATED ZINC ALLOY COATINGS ATOTECH DEUTSCHLAND GMBH (DE) 2009-03-11 EP disclosed
WO-2007147603-A2 AQUEOUS ALKALINE BATH, DEVOID OF CYANIDE, FOR THE DEPOSITION OF ELECTROPLATED ZINC AND ZINC ALLOY COATINGS ATOTECH DEUTSCHLAND GMBH (DE) 2007-12-27 WO disclosed
WO-2007147604-A2 AQUEOUS, ALKALINE BATH, DEVOID OF CYANIDE, FOR DEPOSITING ELECTROPLATED ZINC ALLOY COATINGS ATOTECH DEUTSCHLAND GMBH (DE) 2007-12-27 WO disclosed
EP-1870495-A1 Aqueous alkaline, cyanide-free, bath for the galvanic deposition of Zinc and Zinc alloy layers ATOTECH DEUTSCHLAND GMBH (DE) 2007-12-26 EP disclosed