⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8634384 | 0.74 | SUCNR1 (0.35) | — | |
| SCHEMBL27881920 | 0.71 | — | — | |
| SCHEMBL2216626 | 0.70 | — | — | |
| SCHEMBL27650605 | 0.67 | — | — | |
| SCHEMBL27889209 | 0.65 | ALDH1A1 (0.30) | — | |
| SCHEMBL2217198 | 0.63 | ALDH1A1 (0.38) | — | |
| SCHEMBL19264266 | 0.63 | NOS2 (0.41) | — | |
| SCHEMBL2217441 | 0.62 | — | — | |
| SCHEMBL27278259 | 0.62 | — | — | |
| SCHEMBL27512913 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1808273-B | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO LTD | 2012-12-26 | — | — | CN | disclosed |
| CN-100351309-C | Underlayer coating forming composition for lithography containing compound having protected carboxyl group | NISSAN CHEMICAL IND LTD (JP) | 2007-11-28 | — | — | CN | disclosed |
| CN-1830202-A | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL IND LTD (JP) | 2006-09-06 | — | — | CN | disclosed |
| CN-1808273-A | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO LTD (KR) | 2006-07-26 | — | — | CN | disclosed |