SCHEMBL27699283

SCHEMBL27699283

CC[Cs].O[Si](O)(O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propane SCHEMBL11326424 0.78
SCHEMBL2176730 0.78
Alcohol SCHEMBL2727194 0.74 ALDH1A1 (0.67)
Alcohol SCHEMBL3342049 0.74
SCHEMBL29958700 0.71
Alcohol SCHEMBL648194 0.70 ALDH1A1 (0.60)
Alcohol SCHEMBL28601881 0.70
SCHEMBL11232941 0.70
Ethylamine SCHEMBL3751080 0.70
Ethylamine SCHEMBL16514057 0.70 ALDH1A1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100381526-C Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device SHINETSU CHEMICAL CO (JP) 2008-04-16 CN disclosed