Propane

Propane

SCHEMBL27699488

CCC.Cc1ccccc1S([O])(=O)=O

nearest known ligand 0.47

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAPGEF4 Q8WZA2 1/20 0.47
KMT2A Q03164 2/20 0.42
L3MBTL1 Q9Y468 4/20 0.41
MAPT P10636 4/20 0.41
NPSR1 Q6W5P4 3/20 0.41
GAA P10253 1/20 0.41
KEAP1 Q14145 1/20 0.40
NFE2L2 Q16236 1/20 0.40
TSHR P16473 1/20 0.39
ACHE P22303 1/20 0.39
ALDH1A1 P00352 5/20 0.39
LMNA P02545 2/20 0.39
CYP1A2 P05177 2/20 0.39
CYP2D6 P10635 2/20 0.39
CYP2C19 P33261 2/20 0.39
MCOLN3 Q8TDD5 1/20 0.39
HCRTR2 O43614 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
KDM4E B2RXH2 2/20 0.39
TP53 P04637 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL79052 0.93 TSHR (0.45) RAPGEF4KMT2AL3MBTL1MAPTGAA
Ethane SCHEMBL28769591 0.91 TSHR (0.43) RAPGEF4KMT2AL3MBTL1MAPTGAA
Benzene SCHEMBL27867174 0.91 TSHR (0.43) RAPGEF4KMT2AL3MBTL1GAATSHR
SCHEMBL28234421 0.88 TSHR (0.41) RAPGEF4KMT2AL3MBTL1MAPTGAA
Iodobenzene SCHEMBL27312427 0.81 TSHR (0.40) RAPGEF4KMT2AL3MBTL1GAATSHR
Methyl Phosphonate SCHEMBL27299128 0.81 CA1 (0.40) RAPGEF4KMT2AL3MBTL1GAAALDH1A1
SCHEMBL27927498 0.80 RAPGEF4 (0.38) RAPGEF4KMT2AL3MBTL1MAPTNPSR1
SCHEMBL28110060 0.80 RAPGEF4 (0.38) RAPGEF4KMT2AL3MBTL1MAPTNPSR1
SCHEMBL27755755 0.80 RAPGEF4 (0.38) RAPGEF4KMT2AL3MBTL1MAPTNPSR1
SCHEMBL27531897 0.79 MEN1 (0.36) RAPGEF4KMT2AL3MBTL1GAAKEAP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101040221-B Composition for forming bottom anti-reflective coating containing aromatic sulfonic acid ester compound and light photoacid-generating agent NISSAN CHEMICAL IND LTD 2010-06-16 CN disclosed
CN-101040221-A Composition for forming bottom anti-reflective coating containing aromatic sulfonic acid ester compound and light photoacid-generating agent NISSAN CHEMICAL IND LTD (JP) 2007-09-19 CN disclosed