SCHEMBL2771284

SCHEMBL2771284

C=COCC(=C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2627714 0.86
SCHEMBL292657 0.79
SCHEMBL2955965 0.79 HSD17B10 (0.35)
SCHEMBL975737 0.78
SCHEMBL304934 0.77
SCHEMBL1695588 0.74
SCHEMBL22436613 0.74 CES2 (0.35)
SCHEMBL2627773 0.73 TSHR (0.36)
SCHEMBL1602397 0.73
SCHEMBL7079749 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110396159-B Preparation method of polycarboxylic acid water reducer containing claw-type short side chains 江苏博思通新材料有限公司 2022-04-19 CN claimed
CN-112194762-A Preparation method of non-crosslinked reticular polycarboxylic acid water reducing agent 江苏博思通新材料有限公司 2021-01-08 CN claimed
US-20260035596-A1 COMPOSITIONS FOR POLISHING SUBSTRATES ENTEGRIS INC (US) 2026-02-05 US disclosed
CN-117209688-A Special water-reducing shrinkage reducing agent for UHPC (ultra high pressure polyethylene) and preparation method and application thereof 江苏博思通新材料有限公司 2023-12-12 CN disclosed
US-11384257-B2 Chemical-mechanical polishing composition, rinse composition, chemical-mechanical polishing method, and rinsing method CMC MATERIALS KK 2022-07-12 US disclosed
CN-110396159-B Preparation method of polycarboxylic acid water reducer containing claw-type short side chains 江苏博思通新材料有限公司 2022-04-19 CN disclosed
US-20210284868-A1 CHEMICAL-MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMICAL-MECHANICAL POLISHING METHOD, AND RINSING METHOD ENTEGRIS, INC. 2021-09-16 US disclosed
EP-3823007-A1 CHEMICAL MECHANICAL POLISHING COMPOSITION, RINSING COMPOSITION, CHEMICAL MECHANICAL POLISHING METHOD AND RINSING METHOD Nihon Cabot Microelectronics K.K. (JP) 2021-05-19 EP disclosed
CN-107075309-B Slurry composition, rinsing composition, substrate polishing method, and rinsing method 日本嘉柏微电子株式会社 2020-09-01 CN disclosed
US-9914853-B2 Slurry composition and method for polishing substrate NIHON CABOT MICROELECTRONICS K.K. (JP) 2018-03-13 US disclosed
CN-107075309-A Paste compound, rinse composition, substrate polishing method and rinse method 日本嘉柏微电子株式会社 2017-08-18 CN disclosed
US-20040162368-A1 Thiol compound derivative, hardening compositions containing these derivatives and molded articles thereof UNIMATEC CO., LTD. (JP) 2004-08-19 US disclosed
EP-1394153-A1 THIOL COMPOUND DERIVATIVES&amp;comma; HARDENING COMPOSITIONS CONTAINING THESE DERIVATIVES AND MOLDED ARTICLES THEREOF Unimatec Co., Ltd. (JP) 2004-03-03 EP disclosed
EP-0499233-B1 Organopentasiloxane and method for its preparation DOW CORNING TORAY SILICONE (JP) 1995-09-27 EP disclosed
US-5183912-A ORGANOPENTASILOXANE AND METHOD FOR ITS PREPARATION DOW CORNING TORAY SILICONE CO., LTD. (JP) 1993-02-02 US disclosed
EP-0499233-A2 Organopentasiloxane and method for its preparation Dow Corning Toray Silicone Company, Limited (JP) 1992-08-19 EP disclosed
EP-0074191-B1 HAIR TREATMENT PREPARATION CONTAINING VINYL CAPROLACTAM/VINYL PYRROLIDONE/ALKYLACRYLATE POLYMER GAF CORPORATION (US) 1986-03-12 EP disclosed
US-4521404-A Polymeric hair preparation GAF CORPORATION (US) 1985-06-04 US disclosed
EP-0074191-A2 Hair treatment preparation containing vinyl caprolactam/vinyl pyrrolidone/alkylacrylate polymer GAF CORPORATION (US) 1983-03-16 EP disclosed
US-4137252-A FREE RADICAL POLYMERIZATION CATALYST, CURING CATALYST NIPPON OIL AND FATS CO., LTD. (JP) 1979-01-30 US disclosed