SCHEMBL27722015

SCHEMBL27722015

C(OCC1CO1)C1CO1.CCC(C)(O)O

nearest known ligand 0.57

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.57
MAPK1 P28482 1/20 0.57
ALDH1A1 P00352 9/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
TDP1 Q9NUW8 2/20 0.47
TP53 P04637 4/20 0.38
MAPT P10636 2/20 0.38
HPGD P15428 2/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
HIF1A Q16665 2/20 0.38
CYP1A2 P05177 1/20 0.38
PPARG P37231 1/20 0.38
CYP3A4 P08684 2/20 0.33
VDR P11473 1/20 0.33
GLA P06280 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27351258 0.89 TSHR (0.54) TSHRMAPK1ALDH1A1SMN1; SMN2TDP1
SCHEMBL27877270 0.89 TSHR (0.64) TSHRMAPK1ALDH1A1SMN1; SMN2TDP1
SCHEMBL4298952 0.86 TSHR (0.61) TSHRMAPK1ALDH1A1SMN1; SMN2TDP1
SCHEMBL1908201 0.84 TSHR (0.70) TSHRMAPK1ALDH1A1SMN1; SMN2TDP1
Alcohol SCHEMBL150777 0.81 SMN1; SMN2 (0.58) TSHRMAPK1ALDH1A1SMN1; SMN2TDP1
SCHEMBL28099859 0.81 ALDH1A1 (0.56) TSHRMAPK1ALDH1A1SMN1; SMN2TDP1
Propane SCHEMBL29201 0.81 SMN1; SMN2 (0.62) TSHRMAPK1ALDH1A1SMN1; SMN2TDP1
Methyl Alcohol SCHEMBL6913269 0.81 TSHR (0.59) TSHRMAPK1ALDH1A1SMN1; SMN2TDP1
SCHEMBL28448360 0.81 TSHR (0.55) TSHRMAPK1ALDH1A1SMN1; SMN2TDP1
SCHEMBL4461926 0.80 TSHR (0.59) TSHRMAPK1ALDH1A1SMN1; SMN2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106796394-A Photosensitive resin composition and cured product thereof 学校法人东京理科大学 2017-05-31 CN disclosed
CN-106662814-A Photosensitive resin composition, resist laminate, cured product of photosensitive resin composition, and cured product of resist laminate (11) 日本化药株式会社 2017-05-10 CN disclosed
CN-103608727-A Negative photosensitive resin composition and cured product thereof NIPPON KAYAKU KK 2014-02-26 CN disclosed
CN-102498146-A Polymer compositions and methods of making and using the same POLYMERIGHT INC 2012-06-13 CN disclosed
CN-101309992-A Mercaptan-hardened epoxy polymer compositions and processes for making and using same CHEVRON PHILLIPS CHEMICAL CO (US) 2008-11-19 CN disclosed