SCHEMBL2772250

SCHEMBL2772250

O=Nc1cccc2c(O)cccc12

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 6/20 0.47
ALDH1A1 P00352 4/20 0.47
KDM4E B2RXH2 4/20 0.47
RAB9A P51151 3/20 0.47
NPC1 O15118 3/20 0.47
L3MBTL1 Q9Y468 3/20 0.47
TDP1 Q9NUW8 2/20 0.47
NPSR1 Q6W5P4 2/20 0.47
XBP1 P17861 1/20 0.47
IDO1 P14902 2/20 0.46
CDK2 P24941 1/20 0.45
HSD17B10 Q99714 3/20 0.44
CYP1A2 P05177 2/20 0.44
HPGD P15428 2/20 0.44
ALOX15 P16050 2/20 0.44
APP P05067 1/20 0.44
THRB P10828 1/20 0.44
TSHR P16473 1/20 0.44
CASP1 P29466 1/20 0.44
SNCA P37840 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1032621 0.86 IDO1 (0.59) MAPTALDH1A1KDM4ERAB9ANPC1
SCHEMBL11775136 0.85 ALDH1A1 (0.42) MAPTALDH1A1KDM4ERAB9ANPC1
SCHEMBL28327 0.77 IDO1 (0.73) MAPTALDH1A1KDM4ERAB9ANPC1
SCHEMBL4869305 0.77 IDO1 (0.73) MAPTALDH1A1KDM4ERAB9ANPC1
SCHEMBL29351230 0.77 IDO1 (0.73) MAPTALDH1A1KDM4ERAB9ANPC1
SCHEMBL3078969 0.76 LMNA (0.52) MAPTALDH1A1KDM4ERAB9ANPC1
SCHEMBL431918 0.75
SCHEMBL29975790 0.75
Benzoic Acid SCHEMBL28181479 0.75 DAO (0.48) MAPTALDH1A1KDM4ERAB9ANPC1
Formaldehyde SCHEMBL11763625 0.75 IDO1 (0.61) MAPTALDH1A1KDM4ERAB9ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023139134-A1 FUNCTIONALIZED POLY(ARYL ETHER SULFONES) COPOLYMERS SOLVAY SPECIALTY POLYMERS USA, LLC (US) 2023-07-27 WO disclosed
WO-2023139133-A1 SHAPED ARTICLE COMPRISING A POLY(ARYL ETHER SULFONE) (PAES) POLYMER AND METHOD OF MAKING USING MELT PROCESSING SOLVAY SPECIALTY POLYMERS USA, LLC (US) 2023-07-27 WO disclosed
EP-4177672-A1 RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-10 EP disclosed
CN-107709407-B Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, semiconductor device, and method for producing polyimide precursor composition 富士胶片株式会社 2020-11-17 CN disclosed
EP-3173453-B1 WAFER LAMINATE AND MAKING METHOD SHINETSU CHEMICAL CO (JP) 2020-09-30 EP disclosed
EP-3173453-A1 WAFER LAMINATE AND MAKING METHOD Shin-Etsu Chemical Co., Ltd. (JP) 2017-05-31 EP disclosed
EP-1568681-B1 PROCESS FOR PRODUCING 1,5-DIAMINONAPHTHALENE MITSUI CHEMICALS INC (JP) 2010-04-28 EP disclosed
EP-1757980-A1 Radiation sensitive resin composition JSR Corporation (JP) 2007-02-28 EP disclosed
EP-1568681-A1 PROCESS FOR PRODUCING 1,5-DIAMINONAPHTHALENE Mitsui Chemicals, Inc. (JP) 2005-08-31 EP disclosed
US-6828461-B2 Process for producing 1,5-diaminonaphthalene MITSUI CHEMICALS, INC. (JP) 2004-12-07 US disclosed
US-20040143137-A1 Process for producing 1,5-diaminonaphthalene MITSUI CHEMICALS, INC. (JP) 2004-07-22 US disclosed