⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methylethylamine SCHEMBL14666 | 0.94 | — | — | |
| Methylethylamine SCHEMBL21404234 | 0.89 | — | — | |
| Methylethylamine SCHEMBL19358922 | 0.89 | — | — | |
| Methylethylamine SCHEMBL10539088 | 0.89 | — | — | |
| Methylethylamine SCHEMBL7752889 | 0.89 | — | — | |
| Methylethylamine SCHEMBL23451683 | 0.89 | — | — | |
| Methylethylamine SCHEMBL20507023 | 0.89 | — | — | |
| Methylethylamine SCHEMBL20584249 | 0.89 | TP53 (0.42) | — | |
| Methylethylamine SCHEMBL21352603 | 0.89 | — | — | |
| Methylethylamine SCHEMBL5688559 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101258586-A | Vapor deposition of hafnium silicate materials with tris (dimethylamido) silane | APPLIED MATERIALS INC (US) | 2008-09-03 | — | — | CN | claimed |
| CN-108602839-A | A process for preparing an organoaminosilane; method for producing silylamines from organoaminosilanes | 美国陶氏有机硅公司 | 2018-09-28 | — | — | CN | disclosed |
| CN-108602840-A | High-purity trimethylsilyl amine, preparation method and purposes | 美国陶氏有机硅公司 | 2018-09-28 | — | — | CN | disclosed |