Methylethylamine

Methylethylamine

SCHEMBL7752889

CCNC.O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Methylethylamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118179577-A Alkali treatment-metal synergistic modified ZSM-5 molecular sieve catalyst 中国石油天然气股份有限公司 2024-06-14 CN claimed
WO-2025084429-A1 SILICA PARTICLES FOR COATING COMPOSITION AND LAMINATED SUBSTRATE 日産化学株式会社 2025-04-24 WO disclosed
CN-118179577-A Alkali treatment-metal synergistic modified ZSM-5 molecular sieve catalyst 中国石油天然气股份有限公司 2024-06-14 CN disclosed
EP-3911694-A1 PROCESS FOR PRODUCING POROUS MATERIALS BASF SE (DE) 2021-11-24 EP disclosed
WO-2020148393-A1 PROCESS FOR PRODUCING POROUS MATERIALS BASF SE (DE) 2020-07-23 WO disclosed
CN-109894051-A A kind of full biomass benzoxazine surfactant and preparation method thereof based on amino acid 山东大学 2019-06-18 CN disclosed
CN-105439166-B The method for synthesizing MWW structure molecular screens 中国石油化工股份有限公司 2018-06-08 CN disclosed
CN-103476561-B Method for producing polycarbonate resin, polycarbonate resin film, and method for producing polycarbonate resin pellet 三菱化学株式会社 2017-03-08 CN disclosed
CN-103476828-B method for producing polycarbonate resin 三菱化学株式会社 2016-11-23 CN disclosed
CN-103210011-B The method manufacturing the polyurethane-prepreg of stable storing and the profiled member of the urethane composition derived from solution being made from 赢创德固赛有限公司 2016-08-10 CN disclosed
US-9382378-B2 Polycarbonate resins and processes for producing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2016-07-05 US disclosed
US-20140121348-A1 POLYCARBONATE RESINS AND PROCESSES FOR PRODUCING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2014-05-01 US disclosed
CN-100392820-C Method for polishing wafer SHINETSU HANDOTAI KK (JP) 2008-06-04 CN disclosed
CN-1826684-A Method for polishing wafer SHINETSU HANDOTAI KK (JP) 2006-08-30 CN disclosed
CN-1200692-C Nanoemulsion based on nonionic amphiphilic lipids and aminated silicones and uses OREAL (FR) 2005-05-11 CN disclosed
WO-2001036329-A1 MOLECULAR SIEVES EXXON CHEMICAL PATENTS INC. (US) 2001-05-25 WO disclosed
CN-1196928-A Nanoemulsion based on nonionic amphiphilic lipids and aminated silicones and uses OREAL (FR) 1998-10-28 CN disclosed