Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | CA4 | P22748 | 1/20 | 0.39 |
| ▸ | NAAA | Q02083 | 3/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CES2 | O00748 | 1/20 | 0.32 |
| ▸ | CES1 | P23141 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
| ▸ | NOS2 | P35228 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1525318 | 0.97 | CA1 (0.38) | CA1CA2CA4NAAACYP1A2 | |
| SCHEMBL17730380 | 0.85 | NAAA (0.40) | CA1CA2CA4NAAACYP1A2 | |
| SCHEMBL11126950 | 0.83 | NAAA (0.43) | CA1CA2CA4NAAACYP1A2 | |
| SCHEMBL1524495 | 0.81 | NAAA (0.47) | NAAACES2CES1HSD17B10 | |
| SCHEMBL17731022 | 0.81 | NAAA (0.46) | NAAACYP1A2 | |
| SCHEMBL1193470 | 0.78 | — | — | |
| SCHEMBL1192739 | 0.76 | CES2 (0.39) | CA1CA2CA4NAAACYP1A2 | |
| SCHEMBL1192727 | 0.76 | CES2 (0.39) | CA1CA2CA4NAAACYP1A2 | |
| SCHEMBL9979433 | 0.76 | CES2 (0.39) | CA1CA2CA4NAAACYP1A2 | |
| SCHEMBL435072 | 0.76 | CES2 (0.39) | CA1CA2CA4NAAACYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103969952-B | New compound and its manufacture method, acid agent, anti-corrosion agent composition and Resist patterns forming method | 东京应化工业株式会社 | 2017-08-01 | — | — | CN | disclosed |
| CN-102866585-B | Novel compound and method of producing the same, acid generator, resist composition and method of forming resist | TOKYO OHKA KOGYO CO LTD | 2014-09-24 | — | — | CN | disclosed |
| CN-103969952-A | Novel Compound And Method Of Producing The Same, Acid Generator, Resist Composition And Method Of Forming Resist Pattern | TOKYO OHKA KOGYO CO LTD | 2014-08-06 | — | — | CN | disclosed |
| CN-102344437-B | Resist composition, method of forming resist pattern, compound, and acid generator | TOKYO OHKA KOGYO CO LTD | 2014-05-07 | — | — | CN | disclosed |
| CN-102866585-A | Novel compound and method of producing the same, acid generator, resist composition and method of forming resist | TOKYO OHKA KOGYO CO LTD | 2013-01-09 | — | — | CN | disclosed |
| CN-101464628-B | Novel compound and method for producing same, acid generator, resist composition, and method for forming resist pattern | TOKYO OHKA KOGYO CO LTD | 2012-12-26 | — | — | CN | disclosed |
| CN-101470349-B | Resist composition, method for forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO LTD | 2012-07-18 | — | — | CN | disclosed |
| CN-102566267-A | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO LTD | 2012-07-11 | — | — | CN | disclosed |
| CN-101408728-B | Resist composition, method of forming resist pattern, novel compound and method of producing the same | TOKYO OHKA KOGYO CO LTD | 2012-03-21 | — | — | CN | disclosed |
| CN-101470349-A | Resist composition, method for forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO LTD (JP) | 2009-07-01 | — | — | CN | disclosed |
| CN-101464628-A | Novel compound and method for producing same, acid generator, resist composition, and method for forming resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2009-06-24 | — | — | CN | disclosed |
| CN-101408728-A | Resist composition, method of forming resist pattern, novel compound and method of producing the same | TOKYO OHKA KOGYO CO LTD (JP) | 2009-04-15 | — | — | CN | disclosed |