Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS2 | P35354 | 13/20 | 0.69 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.55 |
| ▸ | METAP2 | P50579 | 1/20 | 0.49 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrogen Sulfide SCHEMBL27853272 | 0.93 | PTGS2 (0.61) | PTGS2PTGDR2METAP2PTGS1 | |
| Trifluoromethanesulfonic Acid SCHEMBL27765516 | 0.87 | PTGS2 (0.54) | PTGS2PTGDR2PTGS1 | |
| SCHEMBL8663382 | 0.84 | PTGS2 (0.58) | PTGS2PTGDR2PTGS1 | |
| Hydrogen Sulfide SCHEMBL27744400 | 0.84 | PTGS2 (0.96) | PTGS2PTGS1 | |
| SCHEMBL16574199 | 0.83 | PTGS2 (0.61) | PTGS2PTGDR2METAP2PTGS1 | |
| SCHEMBL5502727 | 0.82 | PTGS2 (1.00) | PTGS2PTGS1 | |
| SCHEMBL11045136 | 0.82 | PTGS2 (0.53) | PTGS2PTGDR2PTGS1 | |
| SCHEMBL28806749 | 0.81 | PTGS2 (0.59) | PTGS2PTGDR2 | |
| SCHEMBL9535521 | 0.81 | PTGS2 (0.59) | PTGS2PTGDR2PTGS1 | |
| SCHEMBL28022695 | 0.81 | PTGS2 (0.59) | PTGS2PTGDR2PTGS1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101395189-B | Fluorine-containing polymer, method for purifying same, and radiation-sensitive resin composition | JSR CORP | 2013-07-17 | — | — | CN | disclosed |
| CN-102037030-A | Radiation-sensitive resin composition for liquid immersion exposure, polymer and method for forming resist pattern | JSR CORP | 2011-04-27 | — | — | CN | disclosed |
| CN-101395189-A | Fluorine-containing polymer, method for purifying same, and radiation-sensitive resin composition | JSR CORP (JP) | 2009-03-25 | — | — | CN | disclosed |