SCHEMBL27744758

SCHEMBL27744758

CC1=C(C)C(C(C)C)c2ccc(C)c(C)c21

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TDP2 O95551 1/20 0.32
NSD2 O96028 1/20 0.32
HSP90AA1 P07900 1/20 0.32
PAX8 Q06710 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28543844 0.74 TDP2 (0.35) TDP2NSD2HSP90AA1PAX8
Hydrochloric Acid SCHEMBL27500044 0.73 TDP2 (0.32) TDP2NSD2HSP90AA1PAX8
Hydrochloric Acid SCHEMBL28629518 0.71 TDP2 (0.33) TDP2NSD2HSP90AA1PAX8
SCHEMBL28113748 0.64 MEN1 (0.35)
Hydrochloric Acid SCHEMBL7821332 0.63 TDP2 (0.31) TDP2NSD2HSP90AA1PAX8
SCHEMBL525932 0.63 MAPT (0.31)
SCHEMBL3231558 0.63 MAPT (0.31)
SCHEMBL7634413 0.63 TDP2 (0.33) TDP2NSD2HSP90AA1PAX8
SCHEMBL28011736 0.63 TDP2 (0.33) TDP2NSD2HSP90AA1PAX8
SCHEMBL15723692 0.62 KDM4E (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101450983-A Synthetic process of high temperature resistant epoxy vinyl ester resin HUACHANG POLYMER CO LTD (CN) 2009-06-10 CN claimed
CN-101450983-A Synthetic process of high temperature resistant epoxy vinyl ester resin HUACHANG POLYMER CO LTD (CN) 2009-06-10 CN disclosed