Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PIN1 | Q13526 | 3/20 | 0.41 |
| ▸ | IDO1 | P14902 | 2/20 | 0.39 |
| ▸ | CHRM4 | P08173 | 3/20 | 0.38 |
| ▸ | DRD2 | P14416 | 3/20 | 0.38 |
| ▸ | HTR7 | P34969 | 3/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | TAS1R3 | Q7RTX0 | 4/20 | 0.37 |
| ▸ | TAS1R1 | Q7RTX1 | 4/20 | 0.37 |
| ▸ | TAS1R2 | Q8TE23 | 3/20 | 0.37 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.34 |
| ▸ | HTR2C | P28335 | 1/20 | 0.34 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.34 |
| ▸ | DRD3 | P35462 | 1/20 | 0.34 |
| ▸ | AVPR1A | P37288 | 1/20 | 0.34 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2188983 | 0.87 | IDO1 (0.50) | PIN1IDO1CHRM4DRD2HTR7 | |
| SCHEMBL29733350 | 0.79 | IDO1 (0.53) | IDO1CHRM4DRD2HTR7ALDH1A1 | |
| SCHEMBL2190894 | 0.79 | IDO1 (0.53) | IDO1CHRM4DRD2HTR7ALDH1A1 | |
| SCHEMBL2774502 | 0.78 | SMN1; SMN2 (0.40) | PIN1IDO1CHRM4DRD2HTR7 | |
| SCHEMBL2192860 | 0.78 | IDO1 (0.48) | PIN1IDO1CHRM4DRD2HTR7 | |
| SCHEMBL2190012 | 0.77 | IDO1 (0.47) | PIN1IDO1CHRM4DRD2HTR7 | |
| SCHEMBL19771575 | 0.77 | IDO1 (0.47) | PIN1IDO1CHRM4DRD2HTR7 | |
| SCHEMBL3297240 | 0.73 | ALDH1A1 (0.48) | KDM4EALDH1A1MAPTTSHRTDP1 | |
| SCHEMBL16866687 | 0.73 | POLB (0.38) | PIN1IDO1 | |
| SCHEMBL817976 | 0.73 | IDO1 (0.56) | PIN1IDO1CHRM4DRD2HTR7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8841061-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-23 | — | — | US | disclosed |
| US-8808966-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-19 | — | — | US | disclosed |
| US-8574817-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8450042-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-28 | — | — | US | disclosed |
| US-20130084528-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |
| US-20130084529-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |
| US-20130084527-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |
| US-20130029269-A1 | POSITIVE RESIST COMPOSITION AND PATTTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-31 | — | — | US | disclosed |
| US-20100227274-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-09-09 | — | — | US | disclosed |