Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.49 |
| ▸ | TSHR | P16473 | 2/20 | 0.45 |
| ▸ | LMNA | P02545 | 2/20 | 0.43 |
| ▸ | POLB | P06746 | 2/20 | 0.43 |
| ▸ | RECQL | P46063 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 2/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | LGMN | Q99538 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23662579 | 0.97 | ALDH1A1 (0.46) | ALDH1A1TSHRLMNAPOLBRECQL | |
| SCHEMBL10340227 | 0.88 | ALDH1A1 (0.46) | ALDH1A1POLBRAB9AKMT2AMAPT | |
| SCHEMBL10340224 | 0.88 | ALDH1A1 (0.46) | ALDH1A1POLBRAB9AKMT2AMAPT | |
| SCHEMBL10340228 | 0.88 | ALDH1A1 (0.46) | ALDH1A1POLBRAB9AKMT2AMAPT | |
| SCHEMBL12015496 | 0.85 | ALDH1A1 (0.39) | ALDH1A1TSHRPOLBRECQLCYP3A4 | |
| SCHEMBL11483634 | 0.83 | ALDH1A1 (0.44) | ALDH1A1POLBRAB9AKMT2AMAPT | |
| SCHEMBL2098632 | 0.81 | CHRM4 (0.45) | ALDH1A1LMNAPOLBRAB9AKMT2A | |
| SCHEMBL12017273 | 0.79 | ALDH1A1 (0.34) | ALDH1A1LMNAPOLBCYP3A4CYP2C19 | |
| SCHEMBL20193826 | 0.79 | ALDH1A1 (0.42) | ALDH1A1POLBRAB9AL3MBTL1KMT2A | |
| SCHEMBL14296477 | 0.78 | ALDH1A1 (0.46) | ALDH1A1POLBCYP3A4CYP2C19L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101477307-B | Photomask blank, resist pattern forming process, and photomask preparation process | SHIN ETSU EHEMICAL CO LTD | 2012-12-12 | — | — | CN | disclosed |
| CN-101477307-A | Photomask blank, resist pattern forming process, and photomask preparation process | SHINETSU CHEMICAL CO (JP) | 2009-07-08 | — | — | CN | disclosed |