SCHEMBL277835

SCHEMBL277835

C=C(C)C(=O)OC.CC(=CC(=CC(C)(C)C)C(=O)O)C(=O)O

nearest known ligand 0.47

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL278594 0.87 GRIK1 (0.30)
SCHEMBL6839660 0.85 ALDH1A1 (0.56) ALDH1A1
SCHEMBL602498 0.85 ALDH1A1 (0.56) ALDH1A1
SCHEMBL5661663 0.81 ALDH1A1 (0.50) ALDH1A1
SCHEMBL4947083 0.76 ALDH1A1 (0.58) ALDH1A1
SCHEMBL9114515 0.76 ALDH1A1 (0.58) ALDH1A1
SCHEMBL892355 0.74 ALDH1A1 (0.65) ALDH1A1
SCHEMBL9329248 0.74 ALDH1A1 (0.65) ALDH1A1
SCHEMBL8161723 0.74 ALDH1A1 (0.65) ALDH1A1
SCHEMBL17749039 0.74 ALDH1A1 (0.42) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080032243-A1 Photoresist Coating Composition and Method for Forming Fine Contact of Semiconductor Device HYNIX SEMICONDUCTOR INC. (KR) 2008-02-07 US claimed
US-8133547-B2 Photoresist coating composition and method for forming fine contact of semiconductor device HYNIX SEMICONDUCTOR INC. (KR) 2012-03-13 US disclosed
US-20080032243-A1 Photoresist Coating Composition and Method for Forming Fine Contact of Semiconductor Device HYNIX SEMICONDUCTOR INC. (KR) 2008-02-07 US disclosed