SCHEMBL27797118

SCHEMBL27797118

C=CCOC(=O)CNC(=O)C(=C)C

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 1/20 0.42
▸ TDP1 Q9NUW8 1/20 0.39
▸ TET2 Q6N021 1/20 0.37
▸ MAPT P10636 1/20 0.35
▸ CACNA1B Q00975 1/20 0.35
▸ APBA1 Q02410 1/20 0.35
▸ ALDH1A1 P00352 5/20 0.34
▸ GAA P10253 3/20 0.34
▸ SMN1; SMN2 Q16637 2/20 0.34
▸ NPSR1 Q6W5P4 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ LMNA P02545 1/20 0.33
▸ EPHX2 P34913 1/20 0.33
▸ PKM P14618 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.32
▸ THRB P10828 1/20 0.31
▸ EGLN1 Q9GZT9 1/20 0.31
▸ MGAM O43451 1/20 0.30
▸ SI P14410 1/20 0.30
▸ MGAM2 Q2M2H8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10603014 0.83 TSHR (0.46) TSHRTDP1TET2MAPTCACNA1B
SCHEMBL23031199 0.83 TSHR (0.47) TSHRTDP1MAPTCACNA1BAPBA1
SCHEMBL26556237 0.83 TET2 (0.43) TSHRTDP1TET2ALDH1A1GAA
SCHEMBL16857583 0.81 TET2 (0.39) TET2ALDH1A1LMNAEGLN1TGFBR1
SCHEMBL23031134 0.80 TSHR (0.53) TSHRTDP1MAPTCACNA1BAPBA1
SCHEMBL7255827 0.80 EGLN1 (0.34) TDP1TET2ALDH1A1LMNATHRB
SCHEMBL19566667 0.79 GAA (0.54) TSHRTET2MAPTALDH1A1GAA
SCHEMBL253364 0.77 TSHR (0.43) TSHRTDP1MAPTCACNA1BAPBA1
SCHEMBL17589193 0.77 TET2 (0.61) TSHRTET2ALDH1A1GAASMN1; SMN2
SCHEMBL16385886 0.76 THRB (0.39) TSHRTDP1TET2MAPTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103660089-B System and method for producing particles and patterned films 流体科技公司 2017-04-12 — — CN disclosed
CN-103660089-A System and method for producing particles and patterned films LIQUIDIA TECHNOLOGIES INC 2014-03-26 — — CN disclosed
CN-101896337-B Systems and methods for producing particles and patterned films LIQUIDIA TECHNOLOGIES INC 2013-10-30 — — CN disclosed
CN-101896337-A Systems and methods for producing particles and patterned films LIQUIDIA TECHNOLOGIES INC 2010-11-24 — — CN disclosed
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