SCHEMBL2779844

SCHEMBL2779844

C=C(C)C(=O)OCC(C)(C)CO.C=C(C)C(=O)OCCCCCCOC(=O)C(C)(C)CO

nearest known ligand 0.50

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.50
POLB P06746 1/20 0.40
APEX1 P27695 1/20 0.40
HTT P42858 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
THRB P10828 1/20 0.37
CYP4F2 P78329 1/20 0.32
CYP4A11 Q02928 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6866091 0.87 TSHR (0.54) TSHRPOLBAPEX1HTTTDP1
SCHEMBL333975 0.84 TSHR (0.39) TSHRTHRBCYP4F2CYP4A11
SCHEMBL4796812 0.83 TSHR (0.65) TSHRPOLBAPEX1HTTTDP1
SCHEMBL2120830 0.83 TSHR (0.65) TSHRPOLBAPEX1HTTTDP1
SCHEMBL16678759 0.83 TSHR (0.65) TSHRPOLBAPEX1HTTTDP1
SCHEMBL472433 0.82 TSHR (0.38) TSHRTHRBCYP4F2CYP4A11
SCHEMBL27278 0.82 TSHR (0.45) TSHRPOLBAPEX1HTTTDP1
1,5-Pentanediol SCHEMBL944486 0.81 TSHR (0.43) TSHRPOLBAPEX1HTTTDP1
SCHEMBL749957 0.79 TSHR (0.64) TSHRPOLBAPEX1HTTTDP1
SCHEMBL36263 0.79 TSHR (0.38) TSHRPOLBAPEX1HTTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7767381-B2 Photosensitive resin composition, and photosensitive film and stencil for screen printing using the photosensitive composition MURAKAMI CO., LTD. (JP) 2010-08-03 US disclosed
US-20090099275-A1 Photosensitive Resin Composition, and Photosensitive Film and Stencil for Screen Printing Using the Photosensitive Composition MURAKAMI CO., LTD. (JP) 2009-04-16 US disclosed
EP-2019128-A1 PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCED THEREFROM, PHOTOSENSITIVE FILM AND STENCIL FOR SCREEN PRINTING Murakami Co., Ltd. (JP) 2009-01-28 EP disclosed