SCHEMBL6866091

SCHEMBL6866091

C=C(C)C(=O)OCC(C)(C)CO.C=C(C)C(=O)OCCCCCCO

nearest known ligand 0.54

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.54
TDP1 Q9NUW8 2/20 0.43
POLB P06746 1/20 0.43
APEX1 P27695 1/20 0.43
HTT P42858 1/20 0.43
THRB P10828 1/20 0.40
ACHE P22303 6/20 0.36
CYP4F2 P78329 2/20 0.34
CYP4A11 Q02928 2/20 0.34
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
ALDH1A1 P00352 2/20 0.32
RAD52 P43351 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
CYP3A4 P08684 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
1,5-Pentanediol SCHEMBL944486 0.94 TSHR (0.43) TSHRTDP1POLBAPEX1HTT
SCHEMBL16678759 0.87 TSHR (0.65) TSHRTDP1POLBAPEX1HTT
SCHEMBL4796812 0.87 TSHR (0.65) TSHRTDP1POLBAPEX1HTT
1,6-Hexanediol SCHEMBL1899770 0.87 TSHR (0.46) TSHRTDP1POLBAPEX1HTT
SCHEMBL2120834 0.87 TSHR (0.46) TSHRTDP1POLBAPEX1HTT
SCHEMBL2120830 0.87 TSHR (0.65) TSHRTDP1POLBAPEX1HTT
SCHEMBL2779844 0.87 TSHR (0.50) TSHRTDP1POLBAPEX1HTT
SCHEMBL7062767 0.86 TSHR (0.59) TSHRTDP1POLBAPEX1HTT
SCHEMBL27278 0.85 TSHR (0.45) TSHRTDP1POLBAPEX1HTT
SCHEMBL3504159 0.85 TSHR (0.71) TSHRTDP1POLBAPEX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5164425-A Allyl terminated polyesters, fillers SHOWA DENKO K.K. (JP) 1992-11-17 US claimed
EP-0493631-A1 Artificial marble composition SHOWA DENKO KABUSHIKI KAISHA (JP) 1992-07-08 EP claimed
US-11883790-B2 Hollow particles, method for producing same, and usage of same SEKISUI KASEI CO., LTD. (JP) 2024-01-30 US disclosed
US-11369935-B2 Hollow particles and use thereof SEKISUI PLASTICS CO., LTD. (JP) 2022-06-28 US disclosed
EP-3766571-A1 HOLLOW PARTICLES, METHOD FOR PRODUCING SAME, AND USAGE OF SAME SEKISUI KASEI CO., LTD. (JP) 2021-01-20 EP disclosed
US-20210001300-A1 HOLLOW PARTICLES, METHOD FOR PRODUCING SAME, AND USAGE OF SAME SEKISUI KASEI CO., LTD. (JP) 2021-01-07 US disclosed
EP-3514192-A1 HOLLOW PARTICLES AND USE THEREOF Sekisui Plastics Co., Ltd. (JP) 2019-07-24 EP disclosed
US-20190209994-A1 HOLLOW PARTICLES AND USE THEREOF SEKISUI PLASTICS CO., LTD. (JP) 2019-07-11 US disclosed
US-6808865-B1 INK FOR PRINTED CIRCUITS SCREEN PRINTING STENCIL; WATER AND SOLVENT RESISTANT; POLYMER OF POLYVINYL ALCOHOL AND AN N-ALKYLOLACRYLAMIDE, AN ETHYLENICALLY UNSATURATED PHOTOREACTIVE MONOMER, PHOTOPOLYMERIZATION INITIATOR, AND AN EPOXY COMPOUND GOO CHEMICAL CO., LTD. (JP) 2004-10-26 US disclosed
EP-1213327-A1 PHOTOSENSITIVE RESIN COMPOSITION OF AQUEOUS EMULSION TYPE Goo Chemical Co., Ltd. (JP) 2002-06-12 EP disclosed
US-5164425-A Allyl terminated polyesters, fillers SHOWA DENKO K.K. (JP) 1992-11-17 US disclosed
EP-0493631-A1 Artificial marble composition SHOWA DENKO KABUSHIKI KAISHA (JP) 1992-07-08 EP disclosed