Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS2 | P35354 | 9/20 | 0.62 |
| ▸ | MAPK14 | Q16539 | 1/20 | 0.48 |
| ▸ | PTGS1 | P23219 | 10/20 | 0.47 |
| ▸ | BCAT2 | O15382 | 1/20 | 0.47 |
| ▸ | PTPRC | P08575 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1681771 | 0.98 | PTGS2 (0.65) | PTGS2MAPK14PTGS1BCAT2PTPRC | |
| Ammonia Solution, Strong SCHEMBL28994523 | 0.95 | PTGS2 (0.62) | PTGS2MAPK14PTGS1BCAT2PTPRC | |
| SCHEMBL2782853 | 0.95 | PTGS2 (0.68) | PTGS2MAPK14PTGS1BCAT2 | |
| SCHEMBL7737501 | 0.93 | PTGS2 (0.66) | PTGS2MAPK14PTGS1BCAT2 | |
| SCHEMBL2133316 | 0.93 | PTGS2 (0.66) | PTGS2MAPK14PTGS1BCAT2 | |
| Thiophene SCHEMBL8678681 | 0.89 | PTGS2 (0.57) | PTGS2MAPK14PTGS1BCAT2PTPRC | |
| SCHEMBL12270183 | 0.88 | PTGS2 (0.56) | PTGS2MAPK14PTGS1BCAT2PTPRC | |
| SCHEMBL12270289 | 0.88 | PTGS2 (0.56) | PTGS2MAPK14PTGS1BCAT2PTPRC | |
| SCHEMBL27876136 | 0.86 | PTGS2 (0.54) | PTGS2MAPK14PTGS1BCAT2PTPRC | |
| SCHEMBL28603928 | 0.86 | PTGS2 (0.54) | PTGS2MAPK14PTGS1BCAT2PTPRC |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101982808-B | Chemically amplified resist composition and pattern forming process | SHINETSU CHEMICAL CO | 2013-06-26 | — | — | CN | disclosed |
| CN-101982808-A | Chemically amplified resist compositon and pattern forming process | SHINETSU CHEMICAL CO | 2011-03-02 | — | — | CN | disclosed |