Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.57 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.57 |
| ▸ | TP53 | P04637 | 1/20 | 0.57 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.57 |
| ▸ | TSHR | P16473 | 1/20 | 0.57 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.57 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.57 |
| ▸ | MEN1 | O00255 | 2/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.56 |
| ▸ | ESR1 | P03372 | 1/20 | 0.56 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.56 |
| ▸ | XDH | P47989 | 1/20 | 0.52 |
| ▸ | LTA4H | P09960 | 6/20 | 0.48 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.48 |
| ▸ | BAX | Q07812 | 1/20 | 0.48 |
| ▸ | MMP2 | P08253 | 1/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | ALDH2 | P05091 | 1/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL88416 | 0.89 | ALDH1A1 (0.68) | ALDH1A1CYP3A4TP53ALOX15TSHR | |
| SCHEMBL9352993 | 0.89 | ALDH1A1 (0.68) | ALDH1A1CYP3A4TP53ALOX15TSHR | |
| SCHEMBL3744646 | 0.87 | ALDH1A1 (0.65) | ALDH1A1CYP3A4TP53ALOX15TSHR | |
| SCHEMBL2793675 | 0.87 | ALDH1A1 (0.65) | ALDH1A1CYP3A4TP53ALOX15TSHR | |
| Chavicol SCHEMBL30870 | 0.87 | XDH (0.58) | ALDH1A1CYP3A4TP53ALOX15TSHR | |
| Chavicol SCHEMBL10565597 | 0.85 | XDH (0.56) | ALDH1A1CYP3A4TP53ALOX15TSHR | |
| Chavicol SCHEMBL5483528 | 0.85 | XDH (0.56) | ALDH1A1CYP3A4TP53ALOX15TSHR | |
| Chavicol SCHEMBL7924978 | 0.85 | XDH (0.56) | ALDH1A1CYP3A4TP53ALOX15TSHR | |
| Chavicol SCHEMBL11043594 | 0.85 | XDH (0.56) | ALDH1A1CYP3A4TP53ALOX15TSHR | |
| Chavicol SCHEMBL5489418 | 0.85 | XDH (0.56) | ALDH1A1CYP3A4TP53ALOX15TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110003457-A | The manufacturing method of carbonate resin, its manufacturing method, resin varnish and plywood containing allyl | 群荣化学工业株式会社 | 2019-07-12 | — | — | CN | disclosed |
| CN-104871088-A | Photosensitive resin composition and photosensitive film using same | HITACHI CHEMICAL CO LTD | 2015-08-26 | — | — | CN | disclosed |
| CN-104865797-A | Photosensitive resin composition, photosensitive element using the same, forming method of etching-resist pattern, and manufacturing method of touch panel | HITACHI CHEMICAL CO LTD | 2015-08-26 | — | — | CN | disclosed |
| CN-104730864-A | Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, and method for producing touch panel | HITACHI CHEMICAL CO LTD | 2015-06-24 | — | — | CN | disclosed |
| CN-102132212-B | Positive-type photosensitive resin composition, method for producing resist pattern, and electronic component | HITACHI CHEMICAL CO LTD | 2013-08-28 | — | — | CN | disclosed |
| CN-102257431-B | Positive photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL CO LTD | 2013-06-26 | — | — | CN | disclosed |
| CN-101855596-B | Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL CO LTD | 2013-05-22 | — | — | CN | disclosed |
| CN-103091987-A | Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL CO LTD | 2013-05-08 | — | — | CN | disclosed |
| CN-103097954-A | Positive photosensitive resin composition, method of creating resist pattern, and electronic component | HITACHI CHEMICAL CO LTD | 2013-05-08 | — | — | CN | disclosed |
| CN-102257431-A | Positive photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL CO LTD | 2011-11-23 | — | — | CN | disclosed |
| CN-102132212-A | Positive-type photosensitive resin composition, method for producing resist pattern, and electronic component | HITACHI CHEMICAL CO LTD | 2011-07-20 | — | — | CN | disclosed |
| CN-101855596-A | Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL CO LTD | 2010-10-06 | — | — | CN | disclosed |