SCHEMBL27824950

SCHEMBL27824950

c1ccc2c(-c3ccc4nc(-c5cccc6ccccc56)[nH]c4c3)cccc2c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ F2 P00734 3/20 0.48
▸ F10 P00742 3/20 0.48
▸ PLG P00747 3/20 0.48
▸ PLAU P00749 3/20 0.48
▸ PLAT P00750 3/20 0.48
▸ PRSS1 P07477 3/20 0.48
▸ PDE10A Q9Y233 1/20 0.48
▸ SMN1; SMN2 Q16637 5/20 0.48
▸ MEN1 O00255 5/20 0.48
▸ KMT2A Q03164 5/20 0.48
▸ NPC1 O15118 4/20 0.48
▸ RAB9A P51151 4/20 0.48
▸ POLB P06746 3/20 0.48
▸ F9 P00740 1/20 0.47
▸ KDM4E B2RXH2 5/20 0.47
▸ ALDH1A1 P00352 5/20 0.47
▸ HPGD P15428 5/20 0.47
▸ MAPT P10636 4/20 0.47
▸ GAA P10253 3/20 0.47
▸ LMNA P02545 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27824976 0.91 PDE10A (0.59) PLAUPRSS1PDE10ASMN1; SMN2MEN1
SCHEMBL27825166 0.91 PDE10A (0.52) F2F10PLGPLAUPLAT
SCHEMBL27824953 0.88 HPGD (0.47) SMN1; SMN2MEN1KMT2ANPC1RAB9A
SCHEMBL27824957 0.88 CHEK2 (0.52) F2F10PLGPLAUPLAT
SCHEMBL27843978 0.88 CHEK2 (0.49) F2F10PLGPLAUPLAT
SCHEMBL27843963 0.85 PDE10A (0.49) F2F10PLGPLAUPLAT
SCHEMBL27824980 0.85 PDE10A (0.55) PLAUPRSS1PDE10ASMN1; SMN2MEN1
SCHEMBL5951245 0.84 KDR (0.49) F2F10PLGPLAUPLAT
SCHEMBL27824975 0.84 RAB9A (0.57) PDE10ASMN1; SMN2MEN1KMT2ANPC1
SCHEMBL2951540 0.84 ALDH1A1 (0.61) F2F10PLGPLAUPLAT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102236259-A Radiation sensitivity resin composition for display element, interlayer insulation film, protective film and spacer and forming method thereof JSR CORP 2011-11-09 — — CN disclosed
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