Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 3/20 | 0.37 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.37 |
| ▸ | NUDT1 | P36639 | 1/20 | 0.36 |
| ▸ | BACE1 | P56817 | 1/20 | 0.36 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.36 |
| ▸ | PTPN5 | P54829 | 4/20 | 0.36 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.36 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.33 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.33 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.33 |
| ▸ | CNR1 | P21554 | 2/20 | 0.33 |
| ▸ | CNR2 | P34972 | 1/20 | 0.32 |
| ▸ | ACMSD | Q8TDX5 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30320299 | 1.00 | ESR1 (0.37) | ESR1ESR2NUDT1BACE1HSP90AA1 | |
| SCHEMBL29623208 | 1.00 | ESR1 (0.37) | ESR1ESR2NUDT1BACE1HSP90AA1 | |
| SCHEMBL8656679 | 0.92 | ESR1 (0.38) | ESR1ESR2NUDT1BACE1HSP90AA1 | |
| SCHEMBL29623065 | 0.90 | ESR1 (0.39) | ESR1ESR2NUDT1BACE1HSP90AA1 | |
| SCHEMBL278477 | 0.90 | ESR1 (0.39) | ESR1ESR2NUDT1BACE1HSP90AA1 | |
| SCHEMBL30320264 | 0.90 | ESR1 (0.39) | ESR1ESR2NUDT1BACE1HSP90AA1 | |
| SCHEMBL30104451 | 0.87 | NUDT1 (0.39) | ESR1NUDT1BACE1HSP90AA1CNR1 | |
| SCHEMBL278354 | 0.86 | ESR1 (0.40) | ESR1ESR2NUDT1BACE1HSP90AA1 | |
| SCHEMBL29623048 | 0.86 | ESR1 (0.40) | ESR1ESR2NUDT1BACE1HSP90AA1 | |
| SCHEMBL15625210 | 0.86 | NUDT1 (0.36) | ESR1NUDT1BACE1HSP90AA1PTPN5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023024783-A1 | POSITIVE PHOTORESIST AND PREPARATION METHOD, PREPARATION METHOD FOR GLASS HOUSING, AND ELECTRONIC DEVICE | OPPO广东移动通信有限公司 | 2023-03-02 | — | — | WO | claimed |
| US-20160223908-A1 | PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF | PROMERUS, LLC (US) | 2016-08-04 | — | — | US | claimed |
| US-9341949-B2 | Photosensitive compositions and applications thereof | PROMERUS, LLC (US) | 2016-05-17 | — | — | US | claimed |
| US-20140322647-A1 | PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF | SUMITOMO BAKELITE CO., LTD (JP) | 2014-10-30 | — | — | US | claimed |
| WO-2024135717-A1 | THERMOPLASTIC RESIN AND OPTICAL LENS INCLUDING SAME | 三菱瓦斯化学株式会社 | 2024-06-27 | — | — | WO | disclosed |
| WO-2023024783-A1 | POSITIVE PHOTORESIST AND PREPARATION METHOD, PREPARATION METHOD FOR GLASS HOUSING, AND ELECTRONIC DEVICE | OPPO广东移动通信有限公司 | 2023-03-02 | — | — | WO | disclosed |
| CN-106933034-B | Positive photoresist composition | 东京应化工业株式会社 | 2023-01-06 | — | — | CN | disclosed |
| US-11537045-B2 | Photosensitive compositions and applications thereof | PROMERUS, LLC (US) | 2022-12-27 | — | — | US | disclosed |
| EP-4045564-A1 | PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF | Promerus, LLC (US) | 2022-08-24 | — | — | EP | disclosed |
| CN-114555674-A | Photosensitive composition and application thereof | 普罗米鲁斯有限责任公司 | 2022-05-27 | — | — | CN | disclosed |
| WO-2021076131-A1 | PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF | PROMERUS, LLC (US) | 2021-04-22 | — | — | WO | disclosed |
| US-20210116807-A1 | PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF | PROMERUS, LLC (US) | 2021-04-22 | — | — | US | disclosed |
| US-6475694-B2 | MIXTURE OF ALKALI SOLUBLE RESIN, QUINONEDIAZIDE ESTER COMPOUND AND COMPOUND WHICH GENERATES AN ACID UPON EXPOSUR ETO RADIATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-11-05 | — | — | US | disclosed |
| US-6417317-B1 | CONDENSATION POLYMERIZATION OF TRIFUNCTIONAL PHENOLIC COMPOUND WITH ORTHO- AND PARA-POSITIONED HYDROGENS IN PRESENCE OF ALDEHYDE OR KETONE; POSITIVE PHOTORESISTS, COATINGS; HEAT RESISTANCE | TOGYO OHKA KOGYO CO., LTD. (JP) | 2002-07-09 | — | — | US | disclosed |
| US-20020001769-A1 | Positive photoresist composition | TOKYO OHKA KOGYO CO., LTD. | 2002-01-03 | — | — | US | disclosed |
| US-20010024762-A1 | Phenol novolak resin, production process thereof, and positive photoresist composition using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-09-27 | — | — | US | disclosed |
| US-6207788-B1 | FROM 2,6-DIMETHYLOL-4-METHYLPHENOL AND BIS(2,5-DIMETHYL-4-HYDROXYPHENYL)METHANE | TOKYO OHKA KOGYA CO., LTD. (JP) | 2001-03-27 | — | — | US | disclosed |
| US-6187500-B1 | PHOTORESIST MATERIAL COMPRISING BLEND OF ALKALI-SOLUBLE NOVOLAK RESIN AND A 1,2-NAPHTHOQUINONEDIAZIDE-5-SULFONIC ESTER; FINE RESOLUTION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-02-13 | — | — | US | disclosed |
| US-6030741-A | SOLVENT CONTAINING A MIXTURE OF HEPATANONE-2, ETHYL ACETATE AND A HIGH BOILING BENZYL SALICYLATE; RESIST PATTERN EXHIBITING PHOTOSENSITIVITY LESS VARIABLE RELATIVE TO ITS THICKNESS; SUPERIOR SHAPE-PROFILING | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-02-29 | — | — | US | disclosed |
| EP-0902326-A2 | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-03-17 | — | — | EP | disclosed |