Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 3/20 | 0.39 |
| ▸ | NUDT1 | P36639 | 1/20 | 0.38 |
| ▸ | BACE1 | P56817 | 1/20 | 0.38 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.38 |
| ▸ | RXRA | P19793 | 1/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.36 |
| ▸ | CNR1 | P21554 | 1/20 | 0.35 |
| ▸ | ACMSD | Q8TDX5 | 2/20 | 0.34 |
| ▸ | PTGDR2 | Q9Y5Y4 | 2/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.33 |
| ▸ | PSMB5 | P28074 | 1/20 | 0.32 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.32 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.32 |
| ▸ | AR | P10275 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29623065 | 1.00 | ESR1 (0.39) | ESR1NUDT1BACE1HSP90AA1RXRA | |
| SCHEMBL30320264 | 1.00 | ESR1 (0.39) | ESR1NUDT1BACE1HSP90AA1RXRA | |
| SCHEMBL278354 | 0.96 | ESR1 (0.40) | ESR1NUDT1BACE1HSP90AA1RXRA | |
| SCHEMBL15625210 | 0.96 | NUDT1 (0.36) | ESR1NUDT1BACE1HSP90AA1RXRA | |
| SCHEMBL29623048 | 0.96 | ESR1 (0.40) | ESR1NUDT1BACE1HSP90AA1RXRA | |
| SCHEMBL8656679 | 0.93 | ESR1 (0.38) | ESR1NUDT1BACE1HSP90AA1RXRA | |
| SCHEMBL30104451 | 0.91 | NUDT1 (0.39) | ESR1NUDT1BACE1HSP90AA1CYP1A2 | |
| SCHEMBL278349 | 0.90 | ESR1 (0.37) | ESR1NUDT1BACE1HSP90AA1CYP1A2 | |
| SCHEMBL30320299 | 0.90 | ESR1 (0.37) | ESR1NUDT1BACE1HSP90AA1CYP1A2 | |
| SCHEMBL29623208 | 0.90 | ESR1 (0.37) | ESR1NUDT1BACE1HSP90AA1CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160223908-A1 | PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF | PROMERUS, LLC (US) | 2016-08-04 | — | — | US | claimed |
| US-9341949-B2 | Photosensitive compositions and applications thereof | PROMERUS, LLC (US) | 2016-05-17 | — | — | US | claimed |
| US-20140322647-A1 | PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF | SUMITOMO BAKELITE CO., LTD (JP) | 2014-10-30 | — | — | US | claimed |
| CN-106933034-B | Positive photoresist composition | 东京应化工业株式会社 | 2023-01-06 | — | — | CN | disclosed |
| US-11537045-B2 | Photosensitive compositions and applications thereof | PROMERUS, LLC (US) | 2022-12-27 | — | — | US | disclosed |
| EP-4045564-A1 | PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF | Promerus, LLC (US) | 2022-08-24 | — | — | EP | disclosed |
| CN-114555674-A | Photosensitive composition and application thereof | 普罗米鲁斯有限责任公司 | 2022-05-27 | — | — | CN | disclosed |
| US-20210116807-A1 | PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF | PROMERUS, LLC (US) | 2021-04-22 | — | — | US | disclosed |
| WO-2021076131-A1 | PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF | PROMERUS, LLC (US) | 2021-04-22 | — | — | WO | disclosed |
| US-9696623-B2 | Photosensitive compositions and applications thereof | PROMERUS, LLC (US) | 2017-07-04 | — | — | US | disclosed |
| US-20160223908-A1 | PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF | PROMERUS, LLC (US) | 2016-08-04 | — | — | US | disclosed |
| US-6207340-B1 | POSITIVE PHOTORESISTS ALKALI-SOLUBLE RESIN; (B) A NAPHTHOQUINONEDIAZIDE GROUP-CONTAINING COMPOUND; AND (C) A SOLVENT FOR PATTERN IMAGES | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-03-27 | — | — | US | disclosed |
| US-6207788-B1 | FROM 2,6-DIMETHYLOL-4-METHYLPHENOL AND BIS(2,5-DIMETHYL-4-HYDROXYPHENYL)METHANE | TOKYO OHKA KOGYA CO., LTD. (JP) | 2001-03-27 | — | — | US | disclosed |
| US-6187500-B1 | PHOTORESIST MATERIAL COMPRISING BLEND OF ALKALI-SOLUBLE NOVOLAK RESIN AND A 1,2-NAPHTHOQUINONEDIAZIDE-5-SULFONIC ESTER; FINE RESOLUTION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-02-13 | — | — | US | disclosed |
| US-6177226-B1 | PROVIDES A CONTACT HOLE PATTERN IMAGE HAVING LESS DIMPLES AND BEING IN EXACT ACCORDANCE WITH A MASK PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-01-23 | — | — | US | disclosed |
| US-6127087-A | COMPOSITION COMPRISING ALKALI-SOLUBLE RESIN, SPECIFIED QUINONEDIAZIDE COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-10-03 | — | — | US | disclosed |
| US-6120969-A | PHENOLIC RESINS FOR PHOTORESISTS | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-09-19 | — | — | US | disclosed |
| US-6083657-A | PHENOL-FORMALDEHYDE RESIN AND QUINONEDIAZIDE COMPOUND; SEMICONDUCTORS, INTEGRATED CIRCUITS | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-07-04 | — | — | US | disclosed |
| US-6030741-A | SOLVENT CONTAINING A MIXTURE OF HEPATANONE-2, ETHYL ACETATE AND A HIGH BOILING BENZYL SALICYLATE; RESIST PATTERN EXHIBITING PHOTOSENSITIVITY LESS VARIABLE RELATIVE TO ITS THICKNESS; SUPERIOR SHAPE-PROFILING | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-02-29 | — | — | US | disclosed |
| EP-0902326-A2 | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-03-17 | — | — | EP | disclosed |