Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPRC | P08575 | 1/20 | 0.33 |
| ▸ | BCAT2 | O15382 | 1/20 | 0.32 |
| ▸ | BRD9 | Q9H8M2 | 1/20 | 0.31 |
| ▸ | BAZ2B | Q9UIF8 | 1/20 | 0.31 |
| ▸ | BAZ2A | Q9UIF9 | 1/20 | 0.31 |
| ▸ | IDO1 | P14902 | 1/20 | 0.31 |
| ▸ | MAOA | P21397 | 1/20 | 0.31 |
| ▸ | MAOB | P27338 | 1/20 | 0.31 |
| ▸ | CDC25B | P30305 | 1/20 | 0.31 |
| ▸ | AKT1 | P31749 | 1/20 | 0.31 |
| ▸ | SNCA | P37840 | 1/20 | 0.31 |
| ▸ | MAP2K1 | Q02750 | 1/20 | 0.31 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.31 |
| ▸ | EHMT2 | Q96KQ7 | 1/20 | 0.31 |
| ▸ | NSD1 | Q96L73 | 1/20 | 0.31 |
| ▸ | EHMT1 | Q9H9B1 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8373354 | 0.85 | PTPRC (0.33) | PTPRCIDO1MAOAMAOBCDC25B | |
| SCHEMBL13155736 | 0.85 | PTPRC (0.31) | PTPRCIDO1MAOAMAOBCDC25B | |
| SCHEMBL7596839 | 0.81 | HTT (0.41) | — | |
| SCHEMBL5886356 | 0.80 | PTPRC (0.49) | PTPRCBCAT2BRD9BAZ2BBAZ2A | |
| SCHEMBL818753 | 0.80 | BRD9 (0.31) | PTPRCBRD9BAZ2BBAZ2A | |
| SCHEMBL14179209 | 0.78 | CA1 (0.35) | PTPRCIDO1MAOAMAOBCDC25B | |
| SCHEMBL278744 | 0.73 | PTPN1 (0.41) | PTPRCIDO1MAOAMAOBCDC25B | |
| SCHEMBL14488751 | 0.71 | BAZ2B (0.36) | PTPRCBCAT2BRD9BAZ2BBAZ2A | |
| SCHEMBL819288 | 0.71 | BAZ2B (0.33) | PTPRCBCAT2BRD9BAZ2BBAZ2A | |
| SCHEMBL13930823 | 0.70 | BAZ2B (0.35) | BCAT2BRD9BAZ2BBAZ2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8530003-B2 | Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor device | FUJIFILM CORPORATION (JP) | 2013-09-10 | — | — | US | disclosed |
| US-20120115333-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2012-05-10 | — | — | US | disclosed |
| US-8173349-B2 | Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device | FUJIFILM CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-20120088189-A1 | CONDUCTIVE COMPOSITION, TRANSPARENT CONDUCTIVE FILM, DISPLAY ELEMENT AND INTEGRATED SOLAR BATTERY | FUJIFILM CORPORATION (JP) | 2012-04-12 | — | — | US | disclosed |
| US-8133550-B2 | Good breaking elongation characteristics, achievable high sensitivity and high film remaining rate, little in pattern size fluctuation at the heating time after lithographic process, capable of stable pattern formation; manufacturing a semiconductor device | FUJIFILM CORPORATION (JP) | 2012-03-13 | — | — | US | disclosed |
| US-7803510-B2 | Positive photosensitive polybenzoxazole precursor compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2010-09-28 | — | — | US | disclosed |
| US-20100080963-A1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | US | disclosed |
| US-7615324-B2 | Photosensitive composition, and cured relief pattern production method and semiconductor device using the same | FUJIFILM CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| US-7615331-B2 | Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device | FUJIFILM CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| US-7598009-B2 | Photosensitive resin composition, production method for cured relief pattern using it, and semiconductor device | FUJIFILM CORPORATION (JP) | 2009-10-06 | — | — | US | disclosed |
| US-7371501-B2 | Photosensitive resin composition and method for manufacturing semiconductor apparatus using the same | FUJIFILM CORPORATION (JP) | 2008-05-13 | — | — | US | disclosed |
| US-20080081294-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF CURED RELIEF PATTERN USING THE SAME AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20080076849-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-7348122-B2 | Photosensitive resin composition and method for manufacturing semiconductor device using the same | FUJIFILM CORPORATION (JP) | 2008-03-25 | — | — | US | disclosed |
| US-20070254243-A1 | METHOD FOR MANUFACTURING PHOTOSENSITIVE RESIN COMPOSITION AND RELIEF PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2007-11-01 | — | — | US | disclosed |
| US-20070212899-A1 | Photosensitive resin composition and method for manufacturing semiconductor apparatus using the same | FUJIFILM CORPORATION (JP) | 2007-09-13 | — | — | US | disclosed |
| US-7220520-B2 | Photosensitive resin compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2007-05-22 | — | — | US | disclosed |
| US-20070099111-A1 | Novel positive photosensitive polybenzoxazole precursor compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-05-03 | — | — | US | disclosed |
| US-7195849-B2 | Photosensitive resin compositions | ARCH SPECIALTY CHEMICALS, INC. (US) | 2007-03-27 | — | — | US | disclosed |
| US-20070048656-A1 | Photosensitive resin composition and method for manufacturing semiconductor device using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-01 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120115333-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | CD79B, BRIX1, SMARCB1 | PTPRC 3436/4885BCAT2 1506/4885BRD9 604/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.