SCHEMBL2785772

SCHEMBL2785772

O=S(=O)(O)c1cccc(S(=O)(=O)O)c1.[KH]

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.67
HSD17B10 Q99714 4/20 0.67
TSHR P16473 3/20 0.67
TDP1 Q9NUW8 1/20 0.67
SMN1; SMN2 Q16637 2/20 0.62
CA1 P00915 2/20 0.52
CA2 P00918 2/20 0.52
NAPRT Q6XQN6 1/20 0.48
LMNA P02545 2/20 0.46
NT5E P21589 1/20 0.44
SNCA P37840 1/20 0.42
KDM4E B2RXH2 1/20 0.42
HPGD P15428 1/20 0.42
POLB P06746 1/20 0.41
CYP2D6 P10635 1/20 0.41
SENP3 Q9H4L4 2/20 0.41
SENP2 Q9HC62 2/20 0.41
SENP1 Q9P0U3 2/20 0.41
SUMO2 P61956 1/20 0.41
SUMO1 P63165 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5343773 1.00 ALDH1A1 (0.67) ALDH1A1HSD17B10TSHRTDP1SMN1; SMN2
Hydrochloric Acid SCHEMBL8461455 0.97 ALDH1A1 (0.64) ALDH1A1HSD17B10TSHRTDP1SMN1; SMN2
Hydrochloric Acid SCHEMBL8461672 0.97 ALDH1A1 (0.64) ALDH1A1HSD17B10TSHRTDP1SMN1; SMN2
SCHEMBL1563586 0.97 ALDH1A1 (0.70) ALDH1A1HSD17B10TSHRTDP1SMN1; SMN2
SCHEMBL151444 0.97 ALDH1A1 (0.70) ALDH1A1HSD17B10TSHRTDP1SMN1; SMN2
SCHEMBL9550121 0.94 ALDH1A1 (0.67) ALDH1A1HSD17B10TSHRTDP1SMN1; SMN2
Hydrochloric Acid SCHEMBL890392 0.94 ALDH1A1 (0.67) ALDH1A1HSD17B10TSHRTDP1SMN1; SMN2
Hydrochloric Acid SCHEMBL5873323 0.94 ALDH1A1 (0.67) ALDH1A1HSD17B10TSHRTDP1SMN1; SMN2
SCHEMBL128236 0.94 ALDH1A1 (0.67) ALDH1A1HSD17B10TSHRTDP1SMN1; SMN2
SCHEMBL2289285 0.94 ALDH1A1 (0.67) ALDH1A1HSD17B10TSHRTDP1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4255615-B1 POLYMER COMPOSITION AND METHOD FOR MANUFACTURING MEMBRANES THEREFROM SYENSQO SPECIALTY POLYMERS USA LLC (US) 2026-04-22 EP claimed
US-20240017219-A1 POLYMER COMPOSITION AND METHOD FOR MANUFACTURING MEMBRANES THEREFROM SOLVAY SPECIALTY POLYMERS USA, LLC (US) 2024-01-18 US claimed
CN-116761667-A Polymer composition and method for producing film therefrom 索尔维特殊聚合物美国有限责任公司 2023-09-15 CN claimed
US-12630706-B2 Membrane comprising a blend of polyarylethersulfone and polyaryletherketone and method for manufacturing thereof SYENSQO SPECIALTY POLYMERS USA, LLC (US) 2026-05-19 US disclosed
EP-4255615-B1 POLYMER COMPOSITION AND METHOD FOR MANUFACTURING MEMBRANES THEREFROM SYENSQO SPECIALTY POLYMERS USA LLC (US) 2026-04-22 EP disclosed
US-20240017219-A1 POLYMER COMPOSITION AND METHOD FOR MANUFACTURING MEMBRANES THEREFROM SOLVAY SPECIALTY POLYMERS USA, LLC (US) 2024-01-18 US disclosed
CN-116761667-A Polymer composition and method for producing film therefrom 索尔维特殊聚合物美国有限责任公司 2023-09-15 CN disclosed
US-20220267587-A1 MEMBRANE COMPRISING A BLEND OF POLYARYLETHERSULFONE AND POLYARYLETHERKETONE AND METHOD FOR MANUFACTURING THEREOF SYENSQO SPECIALTY POLYMERS USA, LLC 2022-08-25 US disclosed
CN-114621059-A Method for producing m-diphenol by using sulfonated material to neutralize alkali molten material 山东创蓝垚石环保技术有限公司 2022-06-14 CN disclosed
CN-109843997-B Porous article comprising a polymer and an additive, method for the production thereof and use thereof 索尔维特殊聚合物美国有限责任公司 2022-06-03 CN disclosed
CN-114269459-A Films comprising blends of polyarylethersulfones and polyaryletherketones and methods of making the same 索尔维特殊聚合物美国有限责任公司 2022-04-01 CN disclosed
WO-2018065526-A1 POROUS ARTICLE COMPRISING A POLYMER AND AN ADDITIVE, PROCESSES FOR THEIR PREPARATION AND USE THEREOF SOLVAY SPECIALTY POLYMERS USA, LLC (US) 2018-04-12 WO disclosed
EP-2218715-B1 PHOTOACID GENERATOR AND PHOTOREACTIVE COMPOSITION SUMITOMO SEIKA CHEMICALS (JP) 2017-06-28 EP disclosed
US-8216768-B2 Photoacid generator and photoreactive composition SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2012-07-10 US disclosed
US-20100233621-A1 PHOTOACID GENERATOR AND PHOTOREACTIVE COMPOSITION SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2010-09-16 US disclosed
EP-2218715-A1 PHOTOACID GENERATOR AND PHOTOREACTIVE COMPOSITION Sumitomo Seika Chemicals CO. LTD. (JP) 2010-08-18 EP disclosed
EP-0637595-B1 PROCESS FOR PRODUCING POLYMER NIPPON CATALYTIC CHEM IND (JP) 1998-03-25 EP disclosed
US-5470930-A Acid catalyzed addition polymerized composition NIPPON SHOKUBAI CO., LTD. (JP) 1995-11-28 US disclosed
EP-0637595-A1 PROCESS FOR PRODUCING POLYMER NIPPON SHOKUBAI CO., LTD. (JP) 1995-02-08 EP disclosed
US-4968584-A SUBJECTING DEVELOPED PLATE TO BURNING-IN PRETREATMENT FUJI PHOTO FILM CO., LTD. (JP) 1990-11-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12630706-B2 Membrane comprising a blend of polyarylethersulfone and polyaryletherketone and method for manufacturing thereof LNPK, KCNJ1, ABCB7 ALDH1A1 2886/4885HSD17B10 1244/4885TSHR 2808/4885
US-20100233621-A1 PHOTOACID GENERATOR AND PHOTOREACTIVE COMPOSITION ARSA, SULT1A1, CYBA ALDH1A1 261/4885HSD17B10 718/4885TSHR 962/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.