Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 2/20 | 0.39 |
| ▸ | NAAA | Q02083 | 2/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | CYP19A1 | P11511 | 3/20 | 0.31 |
| ▸ | CA12 | O43570 | 1/20 | 0.30 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | CA9 | Q16790 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12803291 | 0.84 | EPHX1 (0.40) | EPHX1NAAAHTTCYP2C19 | |
| SCHEMBL4542072 | 0.81 | EPHX1 (0.41) | EPHX1NAAAHTTCYP2C19CYP19A1 | |
| SCHEMBL2688916 | 0.81 | LMNA (0.39) | — | |
| SCHEMBL2987394 | 0.78 | EPHX1 (0.49) | EPHX1NAAAHTTCYP2C19CYP19A1 | |
| SCHEMBL29276362 | 0.78 | EPHX1 (0.49) | EPHX1NAAAHTTCYP2C19CYP19A1 | |
| SCHEMBL29117589 | 0.78 | EPHX1 (0.49) | EPHX1NAAAHTTCYP2C19CYP19A1 | |
| SCHEMBL12803292 | 0.77 | EPHX1 (0.38) | EPHX1NAAAHTTCYP2C19CYP19A1 | |
| SCHEMBL632278 | 0.76 | EPHX1 (0.46) | EPHX1NAAAHTTCYP2C19CYP19A1 | |
| SCHEMBL29117702 | 0.76 | NAAA (0.46) | EPHX1NAAAHTTCYP2C19CYP19A1 | |
| SCHEMBL27085758 | 0.76 | EPHX1 (0.42) | EPHX1NAAAHTTCYP2C19CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101059656-B | Photo-sensitive resin composition containing inorganic particle, photo-sensitive film, and process of forming inorganic pattern | JSR CORP | 2012-05-16 | — | — | CN | disclosed |