SCHEMBL2792350

SCHEMBL2792350

CCCCCCCC(SOSC(CCCCCCC)c1ccccc1)c1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ HTR2A P28223 1/20 0.41
▸ SLC2A1 P11166 1/20 0.40
▸ CSNK1E P49674 1/20 0.40
▸ ALDH1A1 P00352 1/20 0.39
▸ OPRM1 P35372 2/20 0.39
▸ OPRD1 P41143 2/20 0.39
▸ OPRK1 P41145 2/20 0.39
▸ OPRL1 P41146 2/20 0.39
▸ NAAA Q02083 2/20 0.39
▸ SIGMAR1 Q99720 1/20 0.39
▸ NPC1 O15118 1/20 0.38
▸ RAB9A P51151 1/20 0.38
▸ SMN1; SMN2 Q16637 1/20 0.38
▸ KCNH2 Q12809 2/20 0.37
▸ ASAH1 Q13510 1/20 0.37
▸ PRSS1 P07477 1/20 0.37
▸ PRSS2 P07478 1/20 0.37
▸ PRSS3 P35030 1/20 0.37
▸ CYP19A1 P11511 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28256515 1.00 HTR2A (0.41) HTR2ASLC2A1CSNK1EALDH1A1OPRM1
SCHEMBL27907190 1.00 HTR2A (0.41) HTR2ASLC2A1CSNK1EALDH1A1OPRM1
SCHEMBL27907178 0.93 POLB (0.41) HTR2AALDH1A1OPRM1OPRD1OPRK1
SCHEMBL18042775 0.85 AOC3 (0.41) HTR2AOPRM1OPRD1OPRK1OPRL1
SCHEMBL8082717 0.84 HTR2A (0.44) HTR2ASLC2A1CSNK1EALDH1A1OPRM1
SCHEMBL15105376 0.84 HTR2A (0.44) HTR2ASLC2A1CSNK1EALDH1A1OPRM1
SCHEMBL15105381 0.84 HTR2A (0.44) HTR2ASLC2A1CSNK1EALDH1A1OPRM1
SCHEMBL15105087 0.82 SIGMAR1 (0.43) HTR2ACSNK1EALDH1A1OPRM1OPRD1
SCHEMBL2166901 0.81 SLC2A1 (0.42) SLC2A1CSNK1EALDH1A1OPRM1NPC1
SCHEMBL5137437 0.81 NAAA (0.42) CSNK1EALDH1A1OPRM1OPRD1OPRK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100167010-A1 PLANING COAT AND METHOD FOR PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2010-07-01 — — US disclosed
EP-1999215-A2 PLANING COAT AND METHOD FOR PRODUCING THE SAME Fujifilm Corporation (JP) 2008-12-10 — — EP disclosed
WO-2007119632-A2 PLANING COAT AND METHOD FOR PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2007-10-25 — — WO disclosed
WO-2007119630-A1 PLANING COAT AND METHOD FOR PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2007-10-25 — — WO disclosed
Send feedback