SCHEMBL27928693

SCHEMBL27928693

Cc1cc(Cc2ccc(O)c(C3CCCCC3)c2)cc(Cc2ccc(O)cc2)c1O

nearest known ligand 0.48

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ NUDT1 P36639 1/20 0.48
▸ BACE1 P56817 1/20 0.48
▸ SHBG P04278 1/20 0.40
▸ ESR1 P03372 3/20 0.40
▸ ESR2 Q92731 3/20 0.40
▸ THRB P10828 3/20 0.38
▸ THRA P10827 2/20 0.38
▸ HSP90AA1 P07900 1/20 0.37
▸ KEAP1 Q14145 1/20 0.33
▸ OPRK1 P41145 2/20 0.33
▸ CYP1A2 P05177 1/20 0.32
▸ CYP2D6 P10635 1/20 0.32
▸ CYP2C9 P11712 1/20 0.32
▸ CYP2C19 P33261 1/20 0.32
▸ HPGD P15428 1/20 0.31
▸ NPC1 O15118 1/20 0.31
▸ RAB9A P51151 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3185155 0.95 NUDT1 (0.52) NUDT1BACE1SHBGESR1ESR2
SCHEMBL4056228 0.95 NUDT1 (0.52) NUDT1BACE1SHBGESR1ESR2
SCHEMBL29636450 0.95 NUDT1 (0.52) NUDT1BACE1SHBGESR1ESR2
SCHEMBL30375450 0.95 NUDT1 (0.52) NUDT1BACE1SHBGESR1ESR2
SCHEMBL2386130 0.92 SHBG (0.43) NUDT1BACE1SHBGESR1ESR2
SCHEMBL27946351 0.87 NUDT1 (0.51) NUDT1BACE1ESR1ESR2THRB
SCHEMBL3185992 0.85 ESR1 (0.51) NUDT1BACE1SHBGESR1ESR2
SCHEMBL29636493 0.85 ESR1 (0.51) NUDT1BACE1SHBGESR1ESR2
SCHEMBL30893630 0.85 ESR1 (0.51) NUDT1BACE1SHBGESR1ESR2
SCHEMBL27584474 0.85 NUDT1 (0.43) NUDT1BACE1SHBGESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104160336-A Positive photosensitive resin composition, partition wall, and optical element ASAHI GLASS CO LTD 2014-11-19 — — CN disclosed
CN-102169995-B Negative electrode base member TOKYO OHKA KOGYO CO LTD 2014-09-24 — — CN disclosed
CN-103570503-A Method for purifying cresols, method for producing phenol resin for photosensitive resin composition, and photosensitive resin composition TOKYO OHKA KOGYO CO LTD 2014-02-12 — — CN disclosed
CN-103543606-A Photoresist composition and method for processing glass TOKYO OHKA KOGYO CO LTD 2014-01-29 — — CN disclosed
CN-101809502-B Thick film resists AZ ELECTRONIC MATERIALS USA 2014-01-08 — — CN disclosed
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