SCHEMBL2799693

SCHEMBL2799693

O=c1nc(-c2ccccn2)c2c(=O)nc(-c3ccccn3)c1=2

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 8/20 0.52
LMNA P02545 4/20 0.52
CCR1 P32246 3/20 0.52
CCR5 P51681 3/20 0.52
CCR8 P51685 3/20 0.52
HIF1A Q16665 2/20 0.52
CYP1A2 P05177 1/20 0.52
POLB P06746 1/20 0.52
METAP1 P53582 1/20 0.52
BLM P54132 1/20 0.52
DOHH Q9BU89 1/20 0.52
P4HTM Q9NXG6 1/20 0.52
L3MBTL1 Q9Y468 4/20 0.50
TP53 P04637 3/20 0.50
ALOX15 P16050 3/20 0.50
HTT P42858 3/20 0.50
TDP1 Q9NUW8 2/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
ALPL P05186 1/20 0.50
HSP90AA1 P07900 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL323086 0.77 KDM4E (0.68) KDM4ELMNACCR1CCR5CCR8
SCHEMBL14067720 0.77 KDM4E (0.55) KDM4ELMNACCR1CCR5CCR8
SCHEMBL7802683 0.76 KDM4E (0.43) KDM4ELMNACCR1CCR5CCR8
SCHEMBL8367310 0.73 KDM4E (0.52) KDM4ELMNACCR1CCR5CCR8
SCHEMBL24625410 0.72 KDM4E (0.68) KDM4ELMNACCR1CCR5CCR8
SCHEMBL176039 0.72 KDM4E (0.68) KDM4ELMNACCR1CCR5CCR8
Dipyridyl SCHEMBL1982177 0.71 KDM4E (0.88) KDM4ELMNACCR1CCR5CCR8
Dipyridyl SCHEMBL29351528 0.71 KDM4E (1.00) KDM4ELMNACCR1CCR5CCR8
Dipyridyl SCHEMBL3711450 0.71 KDM4E (1.00) KDM4ELMNACCR1CCR5CCR8
Dipyridyl SCHEMBL29907716 0.71 KDM4E (1.00) KDM4ELMNACCR1CCR5CCR8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5472815-A Process for storing information and a material having information written thereon CIBA-GEIGY CORPORATION (US) 1995-12-05 US claimed
US-5316852-A Coated material and the use thereof CIBA-GEIGY CORPORATION (US) 1994-05-31 US claimed
EP-1679507-B1 Proton acceptance type gas sensor MURATA MANUFACTURING CO (JP) 2014-03-05 EP disclosed
US-8268250-B2 Proton acceptance type sensor, hydrogen gas sensor and acid sensor MURATA MANUFACTURING CO., LTD. (JP) 2012-09-18 US disclosed
US-20100187109-A1 PROTON ACCEPTANCE TYPE SENSOR, HYDROGEN GAS SENSOR AND ACID SENSOR MURATA MANUFACTURING CO., LTD. (JP) 2010-07-29 US disclosed
US-20070140908-A1 Proton acceptance type sensor, hydrogen gas sensor and acid sensor Toyo Ink Mfg., Ltd. of Tokyo, Japan (JP) 2007-06-21 US disclosed
EP-1679507-A1 PROTON ACCEPTANCE TYPE SENSOR, HYDROGEN GAS SENSOR AND ACID SENSOR Toyo Ink Mfg. Co. Ltd. (JP) 2006-07-12 EP disclosed
US-5500314-A Material for storing information CIBA-GEIGY CORPORATION (US) 1996-03-19 US disclosed
US-5472815-A Process for storing information and a material having information written thereon CIBA-GEIGY CORPORATION (US) 1995-12-05 US disclosed
US-5382485-A Process for storing information CIBA-GEIGY CORPORATION (US) 1995-01-17 US disclosed
US-5316852-A Coated material and the use thereof CIBA-GEIGY CORPORATION (US) 1994-05-31 US disclosed