SCHEMBL28024910

SCHEMBL28024910

CCCNNCCCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17145901 0.88 ALDH1A1 (0.56)
SCHEMBL17145900 0.84 CA1 (0.41)
SCHEMBL21195145 0.82
SCHEMBL237213 0.81
SCHEMBL309582 0.78
SCHEMBL308930 0.77
SCHEMBL4847963 0.77
SCHEMBL133776 0.77
SCHEMBL11320949 0.75 TSHR (0.56)
SCHEMBL7713475 0.73 ADH1B (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115702270-B Fiber bundling agent, fiber material, molding material, and molded article DIC株式会社 2025-04-04 CN disclosed
CN-119053634-A Aqueous urethane resin composition DIC株式会社 2024-11-29 CN disclosed
CN-108350307-B The manufacturing method of metal surface treating composition, metal material 日本帕卡濑精株式会社 2019-11-05 CN disclosed
CN-109790372-A Aqueous resin composition, smears and article DIC株式会社 2019-05-21 CN disclosed
CN-108866523-A Water-based metal-surface-treating agent and the tunicate metal material of tool and its manufacturing method 日本帕卡濑精株式会社 2018-11-23 CN disclosed
CN-108864920-A Water-based metal-surface-treating agent and metal material and its manufacturing method with ground process layer 日本帕卡濑精株式会社 2018-11-23 CN disclosed
CN-108864919-A Complex, aqueous resin composition and coating 日本帕卡濑精株式会社 2018-11-23 CN disclosed
CN-108350307-A The manufacturing method of metal surface treating composition, metal material 日本帕卡濑精株式会社 2018-07-31 CN disclosed
CN-105144853-A Method for forming conductive high-definition pattern, and circuit DAINIPPON INK & CHEMICALS 2015-12-09 CN disclosed
CN-103201117-B Resin composition for forming receiving layer, and receiving substrate, printed matter, conductive pattern and circuit obtained using same DIC CORP. (JP) 2015-08-19 CN disclosed