SCHEMBL28030935

SCHEMBL28030935

CCCCOCCCCOCC1COC1

nearest known ligand 0.57

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.57
ALDH1A1 P00352 1/20 0.53
TDP1 Q9NUW8 1/20 0.53
TSHR P16473 3/20 0.43
CYP3A4 P08684 1/20 0.39
SPHK2 Q9NRA0 2/20 0.37
SPHK1 Q9NYA1 1/20 0.37
GBA2 Q9HCG7 2/20 0.36
GBA1 P04062 1/20 0.36
MEN1 O00255 1/20 0.36
THRB P10828 1/20 0.36
HTT P42858 1/20 0.36
KMT2A Q03164 1/20 0.36
MAPT P10636 1/20 0.36
HPGD P15428 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27175298 0.94 ALDH1A1 (0.60) SMN1; SMN2ALDH1A1TDP1TSHRSPHK2
SCHEMBL28774507 0.92 ALDH1A1 (0.63) SMN1; SMN2ALDH1A1TDP1TSHRSPHK2
SCHEMBL11724797 0.92 ALDH1A1 (0.63) SMN1; SMN2ALDH1A1TDP1TSHRSPHK2
SCHEMBL1954604 0.84 SMN1; SMN2 (0.47) SMN1; SMN2ALDH1A1TDP1TSHRCYP3A4
SCHEMBL28441023 0.83
SCHEMBL13107064 0.83 SMN1; SMN2 (0.54) SMN1; SMN2ALDH1A1TDP1TSHRCYP3A4
SCHEMBL29804468 0.83 TSHR (0.48) SMN1; SMN2ALDH1A1TDP1TSHRSPHK2
SCHEMBL29194811 0.82 ALDH1A1 (0.47) SMN1; SMN2ALDH1A1TDP1TSHRCYP3A4
SCHEMBL8354109 0.82 SMN1; SMN2 (0.48) SMN1; SMN2ALDH1A1TDP1TSHRCYP3A4
SCHEMBL13610228 0.79 ALDH1A1 (0.58) SMN1; SMN2ALDH1A1TDP1TSHRSPHK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106462062-A Element, insulating film, method for producing the same, and radiation-sensitive resin composition JSR株式会社 2017-02-22 CN disclosed
CN-105874882-A Display or illumination device, and method for forming insulating film JSR株式会社 2016-08-17 CN disclosed
CN-105009256-A Photosensitive gas generating agent and photocurable composition CANON KK 2015-10-28 CN disclosed