Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | TGFBR1 | P36897 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL5871680 | 0.98 | TDP1 (0.36) | TDP1ALDH1A1TGFBR1KDM4E | |
| SCHEMBL7709808 | 0.83 | TDP1 (0.39) | TDP1ALDH1A1TGFBR1KDM4E | |
| Hydrochloric Acid SCHEMBL11184246 | 0.81 | TDP1 (0.38) | TDP1ALDH1A1TGFBR1KDM4E | |
| SCHEMBL11139937 | 0.79 | TGFBR1 (0.32) | TDP1TGFBR1 | |
| Hydrochloric Acid SCHEMBL5194198 | 0.77 | TDP1 (0.35) | TDP1ALDH1A1TGFBR1 | |
| SCHEMBL138082 | 0.77 | EPHX1 (0.41) | TDP1ALDH1A1TGFBR1KDM4E | |
| SCHEMBL28937708 | 0.76 | TGFBR1 (0.33) | ALDH1A1TGFBR1 | |
| SCHEMBL27482325 | 0.76 | TGFBR1 (0.33) | TDP1ALDH1A1TGFBR1 | |
| SCHEMBL9682306 | 0.76 | RXFP1 (0.34) | TDP1ALDH1A1TGFBR1 | |
| SCHEMBL822811 | 0.75 | ALDH1A1 (0.36) | TDP1ALDH1A1TGFBR1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108713242-A | The grinding method and composition for polishing set group of silicon substrate | 福吉米株式会社 | 2018-10-26 | — | — | CN | disclosed |
| CN-104995277-B | Composition for polishing, composition for polishing manufacture method and abrasive material manufacture method | 福吉米株式会社 | 2018-05-08 | — | — | CN | disclosed |
| CN-105073941-B | Composition for polishing and abrasive material manufacture method | 福吉米株式会社 | 2018-01-30 | — | — | CN | disclosed |
| CN-105264647-B | Silicon Wafer composition for polishing | 福吉米株式会社 | 2018-01-09 | — | — | CN | disclosed |
| CN-106463386-A | Method for polishing silicon wafer, polishing composition, and polishing composition set | 福吉米株式会社 | 2017-02-22 | — | — | CN | disclosed |
| CN-105264647-A | Composition for silicon wafer polishing | FUJIMI INC | 2016-01-20 | — | — | CN | disclosed |
| CN-105073941-A | Polishing composition and method for manufacturing polished article | FUJIMI INC | 2015-11-18 | — | — | CN | disclosed |
| CN-104995277-A | POLISHING COMPOSITION, PRODUCTION METHOD FOR POLISHING COMPOSITION, AND PRODUCTION METHOD FOR POLISHED ARTICLE | FUJIMI INC | 2015-10-21 | — | — | CN | disclosed |