SCHEMBL28033898

SCHEMBL28033898

CC(C)(O)CCC(=O)c1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 3/20 0.55
TDP1 Q9NUW8 3/20 0.55
MAPT P10636 3/20 0.55
LMNA P02545 2/20 0.55
NR4A2 P43354 1/20 0.55
KMT2A Q03164 3/20 0.53
HDAC1 Q13547 5/20 0.50
HDAC8 Q9BY41 5/20 0.50
MAPK1 P28482 3/20 0.50
ALDH1A1 P00352 3/20 0.50
HPGD P15428 2/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
MEN1 O00255 2/20 0.50
KDM4E B2RXH2 1/20 0.50
CYP3A4 P08684 1/20 0.50
ALOX15 P16050 1/20 0.50
CES1 P23141 1/20 0.50
GAA P10253 1/20 0.50
CYP2C19 P33261 1/20 0.50
HDAC3 O15379 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3279580 0.90 ALDH1A1 (0.51) L3MBTL1TDP1MAPTKMT2AALDH1A1
SCHEMBL12601655 0.86 L3MBTL1 (0.57) L3MBTL1TDP1MAPTLMNANR4A2
SCHEMBL25341336 0.84 L3MBTL1 (0.55) L3MBTL1TDP1MAPTLMNANR4A2
Methane SCHEMBL230118 0.84 L3MBTL1 (0.55) L3MBTL1TDP1MAPTLMNANR4A2
SCHEMBL27598014 0.83 TDP1 (0.59) L3MBTL1TDP1MAPTLMNANR4A2
SCHEMBL18266710 0.81 L3MBTL1 (0.52) L3MBTL1TDP1MAPTLMNANR4A2
SCHEMBL28807012 0.81 L3MBTL1 (0.52) L3MBTL1TDP1MAPTLMNANR4A2
SCHEMBL25340770 0.81 L3MBTL1 (0.52) L3MBTL1TDP1MAPTLMNANR4A2
SCHEMBL10707857 0.79 L3MBTL1 (0.50) L3MBTL1TDP1MAPTLMNANR4A2
Benzoic Acid SCHEMBL3683174 0.79 TSHR (0.61) TDP1MAPTKMT2AMAPK1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103102251-B Radiation-ray sensitive composition MITSUBISHI GAS CHEMICAL INC. (JP) 2016-01-20 CN disclosed
CN-102666461-B Ring compound, its production method, radiation-ray sensitive composition and corrosion-resisting pattern formation method MITSUBISHI GAS CHEMICAL CO.,INC. (JP) 2015-09-30 CN disclosed