SCHEMBL28038807

SCHEMBL28038807

CCCCC(C(=O)O)c1cc(C(N)=O)ccc1C(N)=O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPK1 P28482 3/20 0.38
▸ ALDH1A1 P00352 1/20 0.38
▸ TSHR P16473 1/20 0.38
▸ CA2 P00918 1/20 0.37
▸ PARP10 Q53GL7 1/20 0.36
▸ HSD17B10 Q99714 1/20 0.36
▸ NPC1 O15118 3/20 0.36
▸ CPN1 P15169 1/20 0.35
▸ CPB2 Q96IY4 1/20 0.35
▸ MEN1 O00255 1/20 0.35
▸ APAF1 O14727 1/20 0.35
▸ RGS12 O14924 1/20 0.35
▸ HSP90AA1 P07900 1/20 0.35
▸ KMT2A Q03164 1/20 0.35
▸ RAB9A P51151 1/20 0.35
▸ SMN1; SMN2 Q16637 1/20 0.35
▸ LMNA P02545 1/20 0.35
▸ FOLH1 Q04609 1/20 0.35
▸ ERAP2 Q6P179 1/20 0.35
▸ LNPEP Q9UIQ6 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28038486 0.79 LMNA (0.40) MAPK1ALDH1A1CA2HSD17B10MEN1
SCHEMBL28779980 0.79 MAPK1 (0.42) MAPK1ALDH1A1TSHRPARP10HSD17B10
SCHEMBL28779993 0.79 MAPK1 (0.42) MAPK1ALDH1A1TSHRPARP10HSD17B10
SCHEMBL28911813 0.75 GNAI3 (0.50) —
SCHEMBL28552758 0.75 GNAI3 (0.50) —
SCHEMBL28550209 0.75 GNAI3 (0.50) —
SCHEMBL28554607 0.75 GNAI3 (0.50) —
SCHEMBL28556527 0.75 GNAI3 (0.50) —
SCHEMBL28548966 0.75 GNAI3 (0.50) —
SCHEMBL2976652 0.72 ACE2 (0.44) MAPK1ALDH1A1TSHRCA2PARP10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105175715-B Copolymer and method for preparing monomer for forming the same 财团法人工业技术研究院 2018-03-13 — — CN disclosed
CN-105175715-A Copolymer and method for preparing monomer for forming the same IND TECH RES INST 2015-12-23 — — CN disclosed
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