⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL28044181 | 0.97 | — | — | |
| SCHEMBL216024 | 0.71 | — | — | |
| SCHEMBL10864399 | 0.69 | — | — | |
| SCHEMBL10496329 | 0.64 | ALDH1A1 (0.33) | — | |
| SCHEMBL12565607 | 0.64 | — | — | |
| SCHEMBL10865136 | 0.64 | — | — | |
| SCHEMBL19325378 | 0.64 | — | — | |
| SCHEMBL8676221 | 0.62 | — | — | |
| SCHEMBL2289947 | 0.62 | — | — | |
| SCHEMBL26667676 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025228854-A1 | NOVEL SILICON COMPOUNDS, METHOD OF PRODUCING THE SAME, AND METHOD OF DEPOSITING A SILICON-CONTAINING THIN FILMS BY USING THE SAME | MERCK PATENT GMBH (DE) | 2025-11-06 | — | — | WO | disclosed |
| CN-113625534-B | Electrophotographic photoreceptor, image forming apparatus, and coating liquid for forming photosensitive layer | 三菱化学株式会社 | 2024-04-02 | — | — | CN | disclosed |
| US-20230340297-A1 | PHOTOCURABLE COMPOSITION | KOBAYASHI & CO.,LTD. (JP) | 2023-10-26 | — | — | US | disclosed |
| EP-4238997-A1 | PHOTOCURABLE COMPOSITION | Kobayashi & Co., Ltd. (JP) | 2023-09-06 | — | — | EP | disclosed |
| WO-2022091835-A1 | PHOTOCURABLE COMPOSITION | 株式会社コバヤシ | 2022-05-05 | — | — | WO | disclosed |
| CN-109913220-A | Etching composition | 秀博瑞殷株式公社 | 2019-06-21 | — | — | CN | disclosed |
| CN-105273718-B | Etching composition | 秀博瑞殷株式公社 | 2019-05-03 | — | — | CN | disclosed |
| CN-109689838-A | Etching composition and method for manufacturing semiconductor device using the same | 秀博瑞殷株式公社 | 2019-04-26 | — | — | CN | disclosed |
| CN-108291132-A | Etching composition and method for manufacturing semiconductor device using the same | 秀博瑞殷株式公社 | 2018-07-17 | — | — | CN | disclosed |
| CN-105273718-A | Etching composition | SOULBRAIN CO LTD | 2016-01-27 | — | — | CN | disclosed |