SCHEMBL28044163

SCHEMBL28044163

CC(OCC1CO1)C1CC[Si](C)(C)[Si](C)(C)O1

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.31
TSHR P16473 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2883604 0.85 SMN1; SMN2 (0.33) SMN1; SMN2ALDH1A1
SCHEMBL21378205 0.78 TSHR (0.39) SMN1; SMN2TSHRALDH1A1
SCHEMBL6051764 0.74 ALDH1A1 (0.41) SMN1; SMN2TSHRALDH1A1
SCHEMBL28047981 0.71 TSHR (0.34) SMN1; SMN2TSHRALDH1A1
SCHEMBL29014872 0.71
SCHEMBL2136622 0.71 ALDH1A1 (0.37) SMN1; SMN2TSHRALDH1A1
SCHEMBL6689628 0.70
SCHEMBL5794310 0.68
SCHEMBL11703258 0.68
SCHEMBL29240008 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105278249-B A kind of stereolithography rapid prototyping cationic polysiloxane group photosensitive resin composition and its preparation method and application 青岛科技大学 2019-10-25 CN disclosed
CN-105278249-A Stereo-lithography rapid-prototyping cationic polysiloxane photosensitive resin composition and preparation method and application thereof UNIV QINGDAO SCIENCE & TECHNOLOGY 2016-01-27 CN disclosed