⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1242812 | 0.77 | LMNA (0.42) | — | |
| SCHEMBL28366974 | 0.72 | ALDH1A1 (0.32) | — | |
| SCHEMBL29223901 | 0.70 | LMNA (0.36) | — | |
| SCHEMBL28537729 | 0.70 | LMNA (0.35) | — | |
| SCHEMBL50793 | 0.68 | — | — | |
| SCHEMBL28224895 | 0.67 | MAPT (0.32) | — | |
| SCHEMBL28160307 | 0.65 | LMNA (0.31) | — | |
| SCHEMBL27826162 | 0.65 | MAPT (0.32) | — | |
| Trichloroacetic Acid SCHEMBL20917669 | 0.64 | ALDH1A1 (0.39) | — | |
| Ammonia Solution, Strong SCHEMBL29242547 | 0.64 | MAPT (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105527802-A | Photoresist cleaning fluid | ANJI MICROELECTRONICS TECHNOLOGY(SHANGHAI) CO LTD | 2016-04-27 | — | — | CN | claimed |
| CN-105527802-A | Photoresist cleaning fluid | ANJI MICROELECTRONICS TECHNOLOGY(SHANGHAI) CO LTD | 2016-04-27 | — | — | CN | disclosed |