SCHEMBL28051019

SCHEMBL28051019

CC=CC(=O)CC(O)CC(=O)C=CC

nearest known ligand 0.39

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
SLC22A6 Q4U2R8 1/20 0.39
SLC22A16 Q86VW1 1/20 0.30
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10347529 0.88 ALDH1A1 (0.35)
SCHEMBL28909844 0.88
SCHEMBL13071309 0.85 TSHR (0.34) SLC22A6
SCHEMBL11580988 0.84 KDM4E (0.33)
Hydrochloric Acid SCHEMBL3959947 0.83 MAPT (0.55) SLC22A16MAPT
SCHEMBL4480014 0.79
SCHEMBL4480017 0.79
SCHEMBL18161623 0.79
SCHEMBL9726788 0.77 SLC22A6 (0.50) SLC22A6MAPT
SCHEMBL9726786 0.77 SLC22A6 (0.50) SLC22A6MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103119691-B Photocurable nanoimprint composition, method for forming pattern using the composition, and nanoimprint replica mold having cured product of the composition TOKUYAMA CORP. (JP) 2016-01-13 CN disclosed