⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21698511 | 0.75 | MAOB (0.32) | — | |
| SCHEMBL27605635 | 0.74 | — | — | |
| SCHEMBL27446669 | 0.73 | — | — | |
| Hydrochloric Acid SCHEMBL27701861 | 0.72 | KDM1A (0.31) | — | |
| SCHEMBL15527607 | 0.72 | MAOB (0.33) | — | |
| SCHEMBL24771774 | 0.64 | — | — | |
| SCHEMBL23966434 | 0.64 | — | — | |
| SCHEMBL258077 | 0.62 | CACNA1B (0.31) | — | |
| SCHEMBL31211826 | 0.62 | CRHBP (0.34) | — | |
| SCHEMBL21763810 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105301906-A | Positive type photosensitive polyimide resin composition | HANGZHOU FIRST PV MATERIAL CO LTD | 2016-02-03 | — | — | CN | claimed |
| CN-105301906-A | Positive type photosensitive polyimide resin composition | HANGZHOU FIRST PV MATERIAL CO LTD | 2016-02-03 | — | — | CN | disclosed |