Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS1 | P23219 | 1/20 | 0.33 |
| ▸ | PDE4A | P27815 | 1/20 | 0.33 |
| ▸ | APP | P05067 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL419120 | 0.86 | PTGS1 (0.44) | PTGS1PDE4AAPPLMNA | |
| SCHEMBL28179923 | 0.80 | APP (0.46) | PTGS1PDE4AAPPLMNA | |
| SCHEMBL28606550 | 0.79 | PTGS1 (0.48) | PTGS1PDE4AAPPLMNA | |
| SCHEMBL28189201 | 0.78 | PTGS1 (0.34) | PTGS1PDE4A | |
| SCHEMBL28495884 | 0.73 | CA1 (0.35) | PTGS1PDE4ALMNA | |
| SCHEMBL20995951 | 0.72 | PTGS1 (0.44) | PTGS1PDE4AAPPLMNA | |
| SCHEMBL28886376 | 0.72 | PTGS1 (0.44) | PTGS1PDE4AAPPLMNA | |
| SCHEMBL11979583 | 0.71 | APP (0.42) | PTGS1PDE4AAPPLMNA | |
| SCHEMBL29170917 | 0.71 | APP (0.42) | PTGS1PDE4AAPPLMNA | |
| SCHEMBL18343875 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107541757-B | The method of the feature limited from the copper electroplating bath liquid plating photoresist containing pyrazole compound and the reaction product of di-epoxide | 罗门哈斯电子材料有限责任公司 | 2019-07-19 | — | — | CN | disclosed |
| CN-105732955-B | The reaction product of amino acid and epoxides | 罗门哈斯电子材料有限责任公司 | 2018-12-25 | — | — | CN | disclosed |
| CN-105732974-B | Sulfamic acid based polymer for copper electroplating | 罗门哈斯电子材料有限责任公司 | 2018-10-12 | — | — | CN | disclosed |
| CN-106435660-B | The method of the feature limited from copper electroplating bath foam electroplating photoresist | 罗门哈斯电子材料有限责任公司 | 2018-09-21 | — | — | CN | disclosed |
| CN-108026127-A | Copper electroplating bath containing reaction product of amine, polyacrylamide and diepoxide | 罗门哈斯电子材料有限责任公司 | 2018-05-11 | — | — | CN | disclosed |
| CN-107541757-A | The method of the feature limited from the copper electroplating bath liquid plating photoresist containing pyrazole compound and the reaction product of di-epoxide | 罗门哈斯电子材料有限责任公司 | 2018-01-05 | — | — | CN | disclosed |
| CN-107531899-A | Reaction products of amine monomers with polymers containing saturated heterocyclic moieties as plating bath additives | 罗门哈斯电子材料有限责任公司 | 2018-01-02 | — | — | CN | disclosed |
| CN-106435660-A | Method of electroplating photoresist defined features from copper electroplating baths | 罗门哈斯电子材料有限责任公司 | 2017-02-22 | — | — | CN | disclosed |
| CN-105732974-A | AMINO SULFONIC ACID BASED POLYMERS FOR COPPER ELECTROPLATING | 罗门哈斯电子材料有限责任公司 | 2016-07-06 | — | — | CN | disclosed |
| CN-105732542-A | Sulfonamide based polymers for copper electroplating | 罗门哈斯电子材料有限责任公司 | 2016-07-06 | — | — | CN | disclosed |
| CN-105732955-A | Reaction products of amino acids and epoxies | 罗门哈斯电子材料有限责任公司 | 2016-07-06 | — | — | CN | disclosed |
| CN-105705491-A | Polymers containing benzimidazole moieties as levelers | 罗门哈斯电子材料有限责任公司 | 2016-06-22 | — | — | CN | disclosed |