Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.40 |
| ▸ | MAOB | P27338 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 5/20 | 0.39 |
| ▸ | MEN1 | O00255 | 3/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | MCL1 | Q07820 | 2/20 | 0.39 |
| ▸ | NOX1 | Q9Y5S8 | 2/20 | 0.39 |
| ▸ | USP2 | O75604 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | ABCB1 | P08183 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL166161 | 0.94 | ALDH1A1 (0.45) | ALDH1A1HPGDAKR1C3MAOBMAPT | |
| SCHEMBL31320037 | 0.94 | ALDH1A1 (0.45) | ALDH1A1HPGDAKR1C3MAOBMAPT | |
| Benzene SCHEMBL28126416 | 0.94 | ALDH1A1 (0.45) | ALDH1A1HPGDAKR1C3MAOBMAPT | |
| Benzophenone SCHEMBL4430386 | 0.93 | ALDH1A1 (0.47) | ALDH1A1HPGDAKR1C3MAOBMAPT | |
| Acetophenone SCHEMBL28208643 | 0.88 | ALDH1A1 (0.45) | ALDH1A1HPGDLMNAAKR1C3MAOB | |
| SCHEMBL28174354 | 0.88 | POLB (0.44) | ALDH1A1HPGDAKR1C3MAOBMEN1 | |
| Anthraquinone SCHEMBL28265208 | 0.86 | KEAP1 (0.46) | ALDH1A1HPGDLMNAAKR1C3MAOB | |
| Diphenylmethane SCHEMBL28146720 | 0.83 | ALDH1A1 (0.37) | ALDH1A1HPGDLMNAAKR1C3MAOB | |
| SCHEMBL27715391 | 0.83 | ALDH1A1 (0.43) | ALDH1A1HPGDAKR1C3MAOBMAPT | |
| SCHEMBL29772315 | 0.82 | ALDH1A1 (0.50) | ALDH1A1HPGDAKR1C3MAOBMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105103050-B | Method for producing substrate having pattern and resin composition for hydrofluoric acid etching | 日产化学工业株式会社 | 2019-12-03 | — | — | CN | disclosed |
| CN-110494510-A | Ink-jet solidification compound group, solidfied material, its manufacturing method, the wafer-class encapsulation of printed circuit board and fan-out-type | TAIYO INK MFG CO LTD | 2019-11-22 | — | — | CN | disclosed |
| CN-110088681-A | Negative light-sensitive resin combination | ＡＧＣ株式会社 | 2019-08-02 | — | — | CN | disclosed |
| CN-105102390-B | Method for manufacturing thin-walled glass substrate | 日产化学工业株式会社 | 2019-03-01 | — | — | CN | disclosed |
| CN-104423152-B | Photosensitive polymer combination, dry film, solidfied material and printed circuit board (PCB) | 太阳油墨制造株式会社 | 2016-07-06 | — | — | CN | disclosed |
| CN-103890128-B | Refuse the ink manufacture method of agent, negative light-sensitive resin combination, partition wall and optical element | 旭硝子株式会社 | 2016-06-29 | — | — | CN | disclosed |
| CN-104271642-B | Partial hydrolysis condensate, ink-repellent agent, negative photosensitive resin composition, cured film, partition wall, and optical element | 旭硝子株式会社 | 2016-06-22 | — | — | CN | disclosed |