Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Diphenhydramine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HRH1 known ✓ | P35367 | 2/20 | 0.83 |
| ▸ | SLC6A2 | P23975 | 7/20 | 0.83 |
| ▸ | SLC6A4 | P31645 | 7/20 | 0.83 |
| ▸ | SLC6A3 | Q01959 | 7/20 | 0.83 |
| ▸ | LMNA | P02545 | 3/20 | 0.83 |
| ▸ | CHRM2 | P08172 | 3/20 | 0.83 |
| ▸ | ADRA2A | P08913 | 3/20 | 0.83 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.83 |
| ▸ | OPRM1 | P35372 | 3/20 | 0.83 |
| ▸ | DRD3 | P35462 | 3/20 | 0.83 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.83 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.83 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.83 |
| ▸ | ADRA2B | P18089 | 2/20 | 0.83 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.83 |
| ▸ | HRH2 | P25021 | 2/20 | 0.83 |
| ▸ | HTR2A | P28223 | 2/20 | 0.83 |
| ▸ | HTR2C | P28335 | 2/20 | 0.83 |
| ▸ | ADRA1A | P35348 | 2/20 | 0.83 |
| ▸ | HTR2B | P41595 | 2/20 | 0.83 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Diphenhydramine SCHEMBL12543374 | 0.91 | SLC6A2 (1.00) | SLC6A2SLC6A4SLC6A3LMNACHRM2 | |
| Diphenhydramine SCHEMBL4064 | 0.91 | SLC6A2 (1.00) | SLC6A2SLC6A4SLC6A3LMNACHRM2 | |
| Diphenhydramine SCHEMBL28188903 | 0.90 | SLC6A2 (0.83) | SLC6A2SLC6A4SLC6A3LMNACHRM2 | |
| SCHEMBL2553732 | 0.90 | SLC6A2 (0.71) | SLC6A2SLC6A4SLC6A3LMNACHRM2 | |
| Diphenhydramine SCHEMBL25219551 | 0.90 | SLC6A2 (0.96) | SLC6A2SLC6A4SLC6A3LMNACHRM2 | |
| Diphenhydramine SCHEMBL10487818 | 0.90 | LMNA (1.00) | SLC6A2SLC6A4SLC6A3LMNACHRM2 | |
| Diphenhydramine SCHEMBL11795332 | 0.90 | SLC6A2 (0.96) | SLC6A2SLC6A4SLC6A3LMNACHRM2 | |
| Diphenhydramine SCHEMBL17071 | 0.90 | LMNA (1.00) | SLC6A2SLC6A4SLC6A3LMNACHRM2 | |
| Diphenhydramine SCHEMBL28210970 | 0.90 | SLC6A2 (0.96) | SLC6A2SLC6A4SLC6A3LMNACHRM2 | |
| Diphenhydramine SCHEMBL29205078 | 0.90 | SLC6A2 (0.96) | SLC6A2SLC6A4SLC6A3LMNACHRM2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105255246-B | Finish compositions and photolithography method | 罗门哈斯电子材料有限公司 | 2019-08-13 | — | — | CN | disclosed |
| CN-109991807-A | Photoresist topcoat compositions and methods of treating photoresist compositions | 罗门哈斯电子材料有限责任公司 | 2019-07-09 | — | — | CN | disclosed |
| CN-109988478-A | The method of photoresist topcoating composition and processing photo-corrosion-resisting agent composition | 罗门哈斯电子材料有限责任公司 | 2019-07-09 | — | — | CN | disclosed |
| CN-108687649-A | The method of the slurry of cation particle and its CMP for spin-coating carbon film | 罗门哈斯电子材料CMP控股股份有限公司 | 2018-10-23 | — | — | CN | disclosed |
| CN-108017970-A | Finish compositions containing fluorination thermal acid generator | 罗门哈斯电子材料有限责任公司 | 2018-05-11 | — | — | CN | disclosed |
| CN-108017971-A | Finish compositions and pattern formation method | 罗门哈斯电子材料有限责任公司 | 2018-05-11 | — | — | CN | disclosed |
| CN-108020987-A | The method of photoresist finish compositions and processing photo-corrosion-resisting agent composition | 罗门哈斯电子材料有限责任公司 | 2018-05-11 | — | — | CN | disclosed |
| CN-106154748-A | Photoresist finish compositions and the method for processing photo-corrosion-resisting agent composition | 罗门哈斯电子材料有限责任公司 | 2016-11-23 | — | — | CN | disclosed |
| CN-103562795-B | Pattern formation method, sensitized ray or radiation-sensitive resin composition and resist film | 富士胶片株式会社 | 2016-08-31 | — | — | CN | disclosed |