Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DPP7 | Q9UHL4 | 8/20 | 0.46 |
| ▸ | DPP8 | Q6V1X1 | 6/20 | 0.46 |
| ▸ | DPP9 | Q86TI2 | 6/20 | 0.46 |
| ▸ | DPP4 | P27487 | 3/20 | 0.46 |
| ▸ | CPB2 | Q96IY4 | 2/20 | 0.40 |
| ▸ | GSR | P00390 | 1/20 | 0.38 |
| ▸ | GNAI3 | P08754 | 1/20 | 0.38 |
| ▸ | GNAO1 | P09471 | 1/20 | 0.38 |
| ▸ | GNAI1 | P63096 | 1/20 | 0.38 |
| ▸ | RRM1 | P23921 | 1/20 | 0.33 |
| ▸ | MMP2 | P08253 | 1/20 | 0.33 |
| ▸ | SLC15A1 | P46059 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2192260 | 0.95 | DPP8 (0.47) | DPP7DPP8DPP9DPP4CPB2 | |
| SCHEMBL2183058 | 0.85 | DPP8 (0.42) | DPP7DPP8DPP9DPP4CPB2 | |
| SCHEMBL7751944 | 0.83 | DPP7 (0.50) | DPP7DPP8DPP9DPP4GSR | |
| SCHEMBL7751947 | 0.83 | DPP7 (0.50) | DPP7DPP8DPP9DPP4GSR | |
| SCHEMBL11649726 | 0.81 | DPP4 (0.50) | DPP7DPP8DPP9DPP4 | |
| SCHEMBL11649721 | 0.81 | DPP4 (0.50) | DPP7DPP8DPP9DPP4 | |
| SCHEMBL3240642 | 0.81 | DPP4 (0.50) | DPP8DPP9DPP4GSR | |
| SCHEMBL1534386 | 0.81 | DPP4 (0.50) | DPP8DPP9DPP4GSR | |
| SCHEMBL7419957 | 0.80 | NPY4R (0.39) | DPP7DPP8DPP9DPP4GNAI3 | |
| SCHEMBL7419967 | 0.80 | NPY4R (0.39) | DPP7DPP8DPP9DPP4GNAI3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105745218-A | Removal of residual cell culture impurities | 诺华股份有限公司 | 2016-07-06 | — | — | CN | disclosed |